論文

査読有り
2016年

Detection of Molecular Oxygen Adsorbate during Room-Temperature Oxidation of Si(100)2×1 Surface: In situ Synchrotron Radiation Photoemission Study

Jpn. J. Appl. Phys.
  • Yoshigoe,Akitaka
  • ,
  • 山田,洋一
  • ,
  • Taga,Ryo
  • ,
  • Ogawa,Shuichi
  • ,
  • Takakuwa,Yuji

55
10
記述言語
日本語
掲載種別
研究論文(学術雑誌)
DOI
10.7567/JJAP.55.100307
出版者・発行元
IOP PUBLISHING LTD

Synchrotron radiation photoelectron spectroscopy during the oxidation of a Si(100) 2 x 1 surface at room temperature revealed the existence of molecularly adsorbed oxygen, which was considered to be absent. The O 1s spectrum of such oxidation was found to be similar to that of Si(111) 7 x 7 surface oxidation. Also, molecular oxygen appeared after the initial surface oxides were formed, indicating that it was not a precursor for dissociation oxygen adsorption on a clean surface. Considering this finding, we have proposed presumable structural models for atomic configurations, where molecular oxygen resided on the oxidized silicon with two oxygen atoms at the backbonds. (C) 2016 The Japan Society of Applied Physics

リンク情報
DOI
https://doi.org/10.7567/JJAP.55.100307

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