論文

査読有り
2014年11月

In situ synchrotron radiation photoelectron spectroscopy study of the oxidation of the Ge(100)-2 x 1 surface by supersonic molecular oxygen beams

JOURNAL OF CHEMICAL PHYSICS
  • Akitaka Yoshigoe
  • ,
  • Yuden Teraoka
  • ,
  • Ryuta Okada
  • ,
  • Yoichi Yamada
  • ,
  • Masahiro Sasaki

141
17
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1063/1.4900633
出版者・発行元
AMER INST PHYSICS

In situ synchrotron radiation photoelectron spectroscopy was performed during the oxidation of the Ge(100)-2 x 1 surface induced by a molecular oxygen beam with various incident energies up to 2.2 eV from the initial to saturation coverage of surface oxides. The saturation coverage of oxygen on the clean Ge(100) surface was much lower than one monolayer and the oxidation state of Ge was + 2 at most. This indicates that the Ge(100) surface is so inert toward oxidation that complete oxidation cannot be achieved with only pure oxygen (O-2) gas, which is in strong contrast to Si surfaces. Two types of dissociative adsorption, trapping-mediated and direct dissociation, were confirmed by oxygen uptake measurements depending on the incident energy of O-2. The direct adsorption process can be activated by increasing the translational energy, resulting in an increased population of Ge2+ and a higher final oxygen coverage. We demonstrated that hyperthermal O-2 beams remarkably promote the room-temperature oxidation with novel atomic configurations of oxides at the Ge(100) surface. Our findings will contribute to the fundamental understanding of oxygen adsorption processes at 300 K from the initial stages to saturated oxidation. (C) 2014 AIP Publishing LLC.

Web of Science ® 被引用回数 : 7

リンク情報
DOI
https://doi.org/10.1063/1.4900633
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000344782200047&DestApp=WOS_CPL

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