Papers

Peer-reviewed
Apr, 2016

Nanostructures of 3-aminopropyltriethoxysilane created on flat substrate by combining colloid lithography and vapor deposition

COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS
  • Naoyuki Ishida
  • ,
  • Ryohei Nishihara
  • ,
  • Hiroyuki Imanaka
  • ,
  • Koreyoshi Imamura

Volume
495
Number
First page
39
Last page
45
Language
English
Publishing type
Research paper (scientific journal)
DOI
10.1016/j.colsurfa.2016.01.047
Publisher
ELSEVIER SCIENCE BV

The creation of patterned structures with micro/nano-scale lengths on flat surfaces has recently been emerged as an important technique in various fields. In this report, we present a simple method to create nanopatterns of 3-aminopropyltriethoxysilane (APS) on glass substrates by the combination of colloid lithography and vapor deposition. When deposition was conducted at room temperature under natural humidity, an array of nanorings was formed on the substrate by the condensation of APS vapor on the water bridges remaining under the particles. By varying only the deposition temperature, the structure of the ordered arrays could easily be transformed: nanorings were converted to honeycomb and dot like structures by increasing temperature. This transformation proposedly occurred by the condensation and polymerization of APS vapor through the deformed particles of the colloidal monolayer. We also fabricated a patterned polymer brush array and a pore array using the obtained APS nanopattern as a template. (C) 2016 Elsevier B.V. All rights reserved.

Link information
DOI
https://doi.org/10.1016/j.colsurfa.2016.01.047
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000371395500005&DestApp=WOS_CPL
URL
http://orcid.org/0000-0001-7603-1151
ID information
  • DOI : 10.1016/j.colsurfa.2016.01.047
  • ISSN : 0927-7757
  • eISSN : 1873-4359
  • ORCID - Put Code : 39386220
  • Web of Science ID : WOS:000371395500005

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