We have developed a novel lithography technique, called the "volume-change thermal-lithography", for fabricating minute dots in less than 100nm diameter. The combination of the temperature distribution induced by a focused-laser beam with a Gaussian distribution and a specially designed multilayer, which consists of TbFeCo and ZnS-SiO2 films, enabled us to produce minute dots. Using a laser beam with a 405 nm wavelength, we succeeded in fabricating dots whose pitch and size are far beyond the optical diffraction limit. Furthermore, we delineated letters of approximately I pm size by dot arrangement for showing the high potential for more complicate fabrication using the technique.