2014年11月
Estimation of negative ions in VHF SiH4/H-2 plasma
JAPANESE JOURNAL OF APPLIED PHYSICS
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回数 : 141
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- 巻
- 53
- 号
- 11
- 開始ページ
- 116101-1
- 終了ページ
- 116101-4
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.7567/JJAP.53.116101
- 出版者・発行元
- IOP PUBLISHING LTD
The characteristics of a VHF SiH4/H-2 plasma (frequency: 60 MHz) at high pressures were examined as a function of silane concentration with a heated Langmuir probe. Anomalous reductions in electron saturation current were observed, suggesting the existence of many negative ions. An estimation of the concentration of negative ions was attempted using the sheath theory including negative ions. It was found that there exist H- and, SiH3- ions as dominant negative ions in the VHF SiH4/H-2 plasma. In addition, the measured floating potential agreed with the theoretical value. (C) 2014 The Japan Society of Applied Physics
- リンク情報
- ID情報
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- DOI : 10.7567/JJAP.53.116101
- ISSN : 0021-4922
- eISSN : 1347-4065
- Web of Science ID : WOS:000346462200049