論文

査読有り
2014年11月

Estimation of negative ions in VHF SiH4/H-2 plasma

JAPANESE JOURNAL OF APPLIED PHYSICS
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回数 : 141
  • Tsukasa Yamane
  • ,
  • Shinya Nakano
  • ,
  • Sachiko Nakao
  • ,
  • Yoshiaki Takeuchi
  • ,
  • Ryuta Ichiki
  • ,
  • Hiroshi Muta
  • ,
  • Kiichiro Uchino
  • ,
  • Yoshinobu Kawai

53
11
開始ページ
116101-1
終了ページ
116101-4
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.7567/JJAP.53.116101
出版者・発行元
IOP PUBLISHING LTD

The characteristics of a VHF SiH4/H-2 plasma (frequency: 60 MHz) at high pressures were examined as a function of silane concentration with a heated Langmuir probe. Anomalous reductions in electron saturation current were observed, suggesting the existence of many negative ions. An estimation of the concentration of negative ions was attempted using the sheath theory including negative ions. It was found that there exist H- and, SiH3- ions as dominant negative ions in the VHF SiH4/H-2 plasma. In addition, the measured floating potential agreed with the theoretical value. (C) 2014 The Japan Society of Applied Physics

リンク情報
DOI
https://doi.org/10.7567/JJAP.53.116101
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000346462200049&DestApp=WOS_CPL
ID情報
  • DOI : 10.7567/JJAP.53.116101
  • ISSN : 0021-4922
  • eISSN : 1347-4065
  • Web of Science ID : WOS:000346462200049

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