2002年
Photovoltaic characteristics of boron doped amorphous carbon films deposited by pulsed laser deposition using graphite target
MOLECULAR CRYSTALS AND LIQUID CRYSTALS
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- 巻
- 386
- 号
- PART 1
- 開始ページ
- 73
- 終了ページ
- 80
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1080/10587250290113222
- 出版者・発行元
- TAYLOR & FRANCIS LTD
This paper reports on the successful deposition of boron (B) doped carbon films (p-C(B)) and fabrication of p-C(B)/n-Si solar cells by pulsed laser deposition (PLD) technique at room temperature using graphite target. The B content in the film was determined by X-ray photoelectron spectroscopy (XPS) to be in the range of 0.2-1.7 atomic percentage. The photovoltaic values of the device, a maximum open circuit voltage, V-oc =250 mV and short circuit current density, J sc =2.113 mA/cm(2) were obtained, when exposed to AM 1.5 illumination (100 mW/cm(2) , 25degreesC). The maximum energy conversion efficiency was found tentatively to be about, eta=0.2%, together with the fill factor, FF=45%. In this paper, the dependence of the B content on electrical and optical properties of the p-C(B) films and the photovoltaic characteristic of the p-C(B)/n-Si structure photovoltaic solar cells are discussed.
- リンク情報
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- DOI
- https://doi.org/10.1080/10587250290113222
- Web of Science
- https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000179750900013&DestApp=WOS_CPL
- URL
- http://www.scopus.com/inward/record.url?eid=2-s2.0-0037826206&partnerID=MN8TOARS
- URL
- http://orcid.org/0000-0002-4113-5548
- ID情報
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- DOI : 10.1080/10587250290113222
- ISSN : 1058-725X
- ORCIDのPut Code : 24004665
- SCOPUS ID : 0037826206
- Web of Science ID : WOS:000179750900013