2008年4月
Ultrahigh-resolution vacuum ultraviolet light source system for extremely low energy photoelectron spectroscopy
JAPANESE JOURNAL OF APPLIED PHYSICS
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- 巻
- 47
- 号
- 4
- 開始ページ
- 2265
- 終了ページ
- 2269
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1143/JJAP.47.2265
- 出版者・発行元
- JAPAN SOCIETY APPLIED PHYSICS
We propose an efficient monochromatization method for the new ultrahigh-resolution Ar, Kr, and Xe light sources to be used for extremely low energy photoelectron spectroscopy (ELEPES). By fully utilizing the short-wavelength transmittance limits known as the Urbach tail of LiF, CaF(2), and sapphire, we can extract only the longest wavelength lines of the resonance lamp with Ar, Kr, and Xe gases by using LiF heated up to similar to 50 degrees C as well as CaF(2) and sapphire at room temperature. The full width at half maximum of the longest wavelength Xe I resonance line is found to be narrower than 500 mu eV. Using these light sources, we can perform ELEPES in laboratories at three photon energies with ultrahigh energy resolution and high efficiency.
- リンク情報
- ID情報
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- DOI : 10.1143/JJAP.47.2265
- ISSN : 0021-4922
- Web of Science ID : WOS:000255449000080