HANEJI Nobuo

Last updated: Mar 1, 2019 at 02:41

Name	HANEJI Nobuo
E-mail	nobynu.ac.jp
Affiliation	Yokohama National University
Section	Faculty of Engineering Division of Intelligent Systems Engineering
Degree	Ph D. of Engineering(The University of Tokyo)

Research Areas

Electrical and electronic engineering / Electronic materials/Electric materials /
Electrical and electronic engineering / Electron device/Electronic equipment /

Education

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1985

Department of Electronic Engineering, Graduate School, Division of Engineering, The University of Tokyo

1982

Department of Electronic Engineering, Graduate School, Division of Engineering, The University of Tokyo

1980

Depaartment of Electronic Engineering, Faculty of Engineering, The University of Tokyo

Published Papers

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Preparation of Amorphous Fluorinated Carbon Film Using Low Global-Warming Potential Gas, C4F6, by Plasma Enhanced Chemical Vapor Deposition

Hiroki Watanabe, Takumi Tokimitsu, Jyunko Shiga, Nobuo Haneji and Yukihiro Shimogaki

Jap. J. Appl. Phys 45(6) L151-L153 Feb 2006 [Refereed]

Improved Etched Surface Morphology in Electron Cyclotron Resonance-Reactive Ion Etching of GaN by Cyclic Injection of CH4/H2/Ar and O2 with Constant Ar Flow

Taro Arakawa, Yoshiki Awa, Tomoyoshi Ide, Nobuo Haneji, Kunio Tada, Masakazu Sugiyama, Hiromasa Shimizu, Yukihiro Shimogaki and Yoshiaki Nakano

Jap. J. Appl. Phys 44(7B) 5819-5823 Jun 2005 [Refereed]

Electrical and Thermal Stability Characteristics of HfCN Films as Metal Gate-Electrode Synthesized by Metalorganic Chemical Vapor Deposition

Wenwu Wang, Toshihide Nabatame, Nobuo Haneji and Yukihiro Shimogaki

Jap. J. Appl. Phys 44(32) L1019-1021 Jun 2005 [Refereed]

Electron Cyclotron Resonance-Reactive Ion Etching of III-V Semiconductors by Cyclic Injection of CH4/H2/Ar and O2 with Constant Ar Flow

N. Haneji, G. Segami, T. Ide, T. Suzuki, T. Arakawa, K. Tada, Y. Shimogaki and Y. Nakano

Jpn. J. Appl. Phys. 42(6B) 3958-3961 Jun 2003 [Refereed]

Kinetic Study on PECVD To Deposit Low-k a-C:F Films Using Appearance Mass Spectrometry

2003 MRS Spring meeting Apr 2003 [Refereed]

Others

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Oct 2005

Embedded Capacitance in WLP