HANEJI Nobuo

J-GLOBAL         Last updated: Mar 1, 2019 at 02:41
 
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Name
HANEJI Nobuo
E-mail
nobynu.ac.jp
Affiliation
Yokohama National University
Section
Faculty of Engineering Division of Intelligent Systems Engineering
Degree
Ph D. of Engineering(The University of Tokyo)

Research Areas

 
 

Education

 
 
 - 
1985
Department of Electronic Engineering, Graduate School, Division of Engineering, The University of Tokyo
 
 
 - 
1982
Department of Electronic Engineering, Graduate School, Division of Engineering, The University of Tokyo
 
 
 - 
1980
Depaartment of Electronic Engineering, Faculty of Engineering, The University of Tokyo
 

Published Papers

 
Preparation of Amorphous Fluorinated Carbon Film Using Low Global-Warming Potential Gas, C4F6, by Plasma Enhanced Chemical Vapor Deposition
Hiroki Watanabe, Takumi Tokimitsu, Jyunko Shiga, Nobuo Haneji and Yukihiro Shimogaki
Jap. J. Appl. Phys   45(6) L151-L153   Feb 2006   [Refereed]
Improved Etched Surface Morphology in Electron Cyclotron Resonance-Reactive Ion Etching of GaN by Cyclic Injection of CH4/H2/Ar and O2 with Constant Ar Flow
Taro Arakawa, Yoshiki Awa, Tomoyoshi Ide, Nobuo Haneji, Kunio Tada, Masakazu Sugiyama, Hiromasa Shimizu, Yukihiro Shimogaki and Yoshiaki Nakano
Jap. J. Appl. Phys   44(7B) 5819-5823   Jun 2005   [Refereed]
Electrical and Thermal Stability Characteristics of HfCN Films as Metal Gate-Electrode Synthesized by Metalorganic Chemical Vapor Deposition
Wenwu Wang, Toshihide Nabatame, Nobuo Haneji and Yukihiro Shimogaki
Jap. J. Appl. Phys   44(32) L1019-1021   Jun 2005   [Refereed]
Electron Cyclotron Resonance-Reactive Ion Etching of III-V Semiconductors by Cyclic Injection of CH4/H2/Ar and O2 with Constant Ar Flow
N. Haneji, G. Segami, T. Ide, T. Suzuki, T. Arakawa, K. Tada, Y. Shimogaki and Y. Nakano
Jpn. J. Appl. Phys.   42(6B) 3958-3961   Jun 2003   [Refereed]
Kinetic Study on PECVD To Deposit Low-k a-C:F Films Using Appearance Mass Spectrometry
2003 MRS Spring meeting      Apr 2003   [Refereed]

Others

 
Oct 2005
Embedded Capacitance in WLP