MISC

2002年4月

High-temperature scanning tunneling microscopy study of Si(111) surface structure changes caused by Ga surface diffusion

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
  • T Ichikawa
  • ,
  • T Onodera
  • ,
  • A Mizoguchi

41
4A
開始ページ
2176
終了ページ
2182
記述言語
英語
掲載種別
DOI
10.1143/JJAP.41.2176
出版者・発行元
INST PURE APPLIED PHYSICS

In order to clarify dynamical transition behaviors among Ga-induced superstructures' on Si(111) surface, a Ga block was placed on a Si(111) surface elevated at 175degreesC and 500degreesC and surface structure changes caused by Ga surface diffusion from the Ga block were in-situ studied by high-temperature scanning tunneling microscopy. Successive structure changes from 7 x 7 dimer adatom stacking-fault (DAS) to 6.3 x 6.3 structure through alpha'-7 x 7 were observed in detail on the Si(111) surface at 170degreesC. No intermediate structure appeared between 7 x 7 DAS and (root3 xroot3)R30 structures on the Si(111) surface at 500degreesC.

リンク情報
DOI
https://doi.org/10.1143/JJAP.41.2176
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000175703100049&DestApp=WOS_CPL
ID情報
  • DOI : 10.1143/JJAP.41.2176
  • ISSN : 0021-4922
  • Web of Science ID : WOS:000175703100049

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