We have proposed and modified a model of drying process of polymer solution coated on a at substrate for at polymer film fabrication supposing resist coating process in semiconductor engineering process and so on. And we have clarified dependence of distribution of polymer molecules on a at substrate after drying on a various parameters based on analysis of many numerical simulations of the model. Then we applied the model to thickness control of a thin film after drying through thermal and evaporative management. In this study, we tried to practice thickness control of a thin film through a simple experiment of thickness control of a thin film after drying through thermal management. And we see that heating a part of a polymer solution film on the substrate from the bottom produces locally higher thickness of a polymer thin film after drying through simple experiments. The results were qualitatively verified through numerical simulation of the model of drying process of polymer solution coated on a at substrate. © 2012 The Surface Science Society of Japan.