Flat and homogeneous polymer film fabrication such as resist coating in photo lithography process is very important for minute fabrication. In many cases, a polymer solution having plural solvents and plural solutes (polymers) is generally used there. So we modify the former dynamical model of drying process of polymer solution coated on a flat substrate for flat and homogeneous polymer film fabrication so as to deal with drying process of solution having plural solutes and plural solvents. As a result, we see that when there are over two kinds of solvents and over two kinds of solutes, solute's distribution after drying obeys the mean value of over two kinds of solvents' parameters through numerical simulations of the modified model. (C) 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim