HORIBE Hideo

J-GLOBAL         Last updated: Apr 13, 2018 at 21:54
 
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Name
HORIBE Hideo
E-mail
hhoribea-chem.eng.osaka-cu.ac.jp
URL
http://http://www.a-chem.eng.osaka-cu.ac.jp/polymer/
Affiliation
Osaka City University
Section
Graduate School of Engineering, Applied Chemistry and Bioengineering Course
Degree
Dr. Eng.(Osaka University), Dr. Eng.(Osaka University), Dr. Eng.(Osaka University)

Research Areas

 
 

Education

 
 
 - 
1985
Faculty of Engineering, Kyoto University
 
 
 - 
1985
Faculty of Engineering, Kyoto University
 
 
 - 
1985
Faculty of Engineering, Kyoto University
 

Misc

 
Yousuke Goto、Yukihiro Angata、Masashi Yamamoto、Toshio Seki、Jiro Matsumoto、Hideo Horibe
Journal of Photopolymer Science and Technology   26(4) 467-472   Jun 2013
中野創, 清水克哉, 越森優人, 野村洋司, 高橋聖司, 扇澤敏明, 堀邊英夫
高分子学会予稿集(CD-ROM)   62(1) ROMBUNNO.2F25   May 2013
山登正文, 大林周平, 堀邊英夫, 高橋弘紀, 渡辺和雄
高分子学会予稿集(CD-ROM)   62(1) ROMBUNNO.1PF072   May 2013
後藤洋介, 今亜耶乃, 高橋聖司, 堀邊英夫
高分子学会予稿集(CD-ROM)   62(1) ROMBUNNO.2F06   May 2013
佐々木保飛, 藤島謙太朗, 高橋聖司, 河野昭彦, 中島康次, 堀邊英夫
高分子学会予稿集(CD-ROM)   62(1) ROMBUNNO.2D07   May 2013

Conference Activities & Talks

 
Measurement of adhesion force of resist to wafer by using SAICAS:Characteristics of lift-off of resist by steam-water mixed spray
10th International symposium on Ultra Clean Processing of Semiconductor Surfaces   2010   
Ion-implanted Resist Removal Using Atomic Hydrogen
HWCVD 2010   2010   
Measurement of adhesion force of resist to wafer by using SAICAS:Characteristics of lift-off of resist by steam-water mixed spray
10th International symposium on Ultra Clean Processing of Semiconductor Surfaces   2010   
Ion-implanted Resist Removal Using Atomic Hydrogen
HWCVD 2010   2010   
Measurement of adhesion force of resist to wafer by using SAICAS:Characteristics of lift-off of resist by steam-water mixed spray
10th International symposium on Ultra Clean Processing of Semiconductor Surfaces   2010   
Ion-implanted Resist Removal Using Atomic Hydrogen
HWCVD 2010   2010   
Novel plasmaless photoresist removal method in gas phase at room temperature
215th ECS Meeting   2009   
Novel plasmaless photoresist removal method in gas phase at room temperature
215th ECS Meeting   2009   
Novel plasmaless photoresist removal method in gas phase at room temperature
215th ECS Meeting   2009   
Resist Removal and Evaluation of Si-Wafer by Atomic Hydrogen
30th International Symposium on Dry Process   2008   
Environmentally friendly resist removal technology using wet ozone
Gwangju Institute of Science and Technology   2008   
Resist Removal and Evaluation of Si-Wafer by Atomic Hydrogen
30th International Symposium on Dry Process   2008   
Environmentally friendly resist removal technology using wet ozone
Gwangju Institute of Science and Technology   2008   
Resist Removal and Evaluation of Si-Wafer by Atomic Hydrogen
30th International Symposium on Dry Process   2008   
Environmentally friendly resist removal technology using wet ozone
Gwangju Institute of Science and Technology   2008   
Control of Crystalline Structure and Diameter of PVDF Nanofiber by Electrospray Deposition
2007   
Control of Crystalline Structure and Diameter of PVDF Nanofiber by Electrospray Deposition
2007   
Control of Crystalline Structure and Diameter of PVDF Nanofiber by Electrospray Deposition
2007   

Research Grants & Projects

 
Electrical Conductivity of Polymer Composites Filled with Electrical Filler
PVDF conformation
Decomposition of organic polymer using ozone or a hydrogen radical
Resist

Patents

 
Process for producing an electrode with positive temperature coefficient(PTC)function
特許第US Patent 6773633号
Mounting structure for a fuel supply apparatus
特許第US Patent 6598593号