2020年10月1日
Concept model of atomic hydrogen dry developing process for photolithographic patterning
AIP Advances
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- ,
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- 巻
- 10
- 号
- 10
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1063/5.0027509
- 出版者・発行元
- AMER INST PHYSICS
© 2020 Author(s). Atomic hydrogen dry etching was used for microstructure fabrication. Photolithography was proposed and achieved by a dry development process using atomic hydrogen irradiation. The reaction system of poly(methyl methacrylate) mixed with molecular benzophenone was examined as a model system for a proof-of-concept study. Optical patterning was experimentally made on a thin layer of poly(methyl methacrylate) with benzophenone by UV light exposure with a photomask. The reaction system acted as a negative tone resist in the proposed process. Thus, a model system for a new atomic hydrogen dry development process was proposed and successfully demonstrated.
- リンク情報
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- DOI
- https://doi.org/10.1063/5.0027509
- Web of Science
- https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000583358100002&DestApp=WOS_CPL
- Scopus
- https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85093945337&origin=inward 本文へのリンクあり
- Scopus Citedby
- https://www.scopus.com/inward/citedby.uri?partnerID=HzOxMe3b&scp=85093945337&origin=inward
- ID情報
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- DOI : 10.1063/5.0027509
- eISSN : 2158-3226
- SCOPUS ID : 85093945337
- Web of Science ID : WOS:000583358100002