2008年
Nanoscale molecular patterning on artificially fabricated nanoscale structured Al surfaces
PROCEEDINGS OF THE 17TH INTERNATIONAL VACUUM CONGRESS/13TH INTERNATIONAL CONFERENCE ON SURFACE SCIENCE/INTERNATIONAL CONFERENCE ON NANOSCIENCE AND TECHNOLOGY
- 巻
- 100
- 号
- 5
- 開始ページ
- 052018
- 終了ページ
- 記述言語
- 英語
- 掲載種別
- DOI
- 10.1088/1742-6596/100/5/052018
- 出版者・発行元
- IOP PUBLISHING LTD
The surface of an Al plate was treated with a combination of chemical and electrochemical processes for fabrication of surface nanoscale structures on Al plates. Chemical treatments by using acetone and pure water under supersonic waves were conducted on an Al surface. Additional electrochemical process in H2SO4 solution created a finer and oriented nanoscale structure on the Al surface. DFM measurement clarified that the nanoscale highly oriented line-structure was successfully created on Al surface. The line distance was estimated approximately 30-40 nm. Molecular patterning on the highly oriented line-structure by copper phthalocyanine (CuPc) was also conducted. The CuPc molecules were put on the nanoscale structure by casting a toluene droplet containing CuPc. DFM and X- ray photoemission spectroscopy (XPS) measurements demonstrated that a molecular pattern that the groove channels were filled with CuPc molecules was fabricated.
- リンク情報
- ID情報
-
- DOI : 10.1088/1742-6596/100/5/052018
- ISSN : 1742-6588
- Web of Science ID : WOS:000275655200114