Papers

Peer-reviewed International journal
Apr, 2011

Macrophage migration inhibitory factor is essential for eosinophil recruitment in allergen-induced skin inflammation.

The Journal of investigative dermatology
  • Yoko Yoshihisa
  • ,
  • Teruhiko Makino
  • ,
  • Kenji Matsunaga
  • ,
  • Ayumi Honda
  • ,
  • Osamu Norisugi
  • ,
  • Riichiro Abe
  • ,
  • Hiroshi Shimizu
  • ,
  • Tadamichi Shimizu

Volume
131
Number
4
First page
925
Last page
31
Language
English
Publishing type
Research paper (scientific journal)
DOI
10.1038/jid.2010.418
Publisher
NATURE PUBLISHING GROUP

Macrophage migration inhibitory factor (MIF) is a pluripotent cytokine that has an essential role in the pathophysiology of experimental allergic inflammation. Recent findings suggest that MIF is involved in several allergic disorders, including atopic dermatitis (AD). In this study, the role of MIF in allergic skin inflammation was examined using a murine model of AD elicited by epicutaneous sensitization with ovalbumin (OVA). We observed the number of skin-infiltrating eosinophils to significantly increase in OVA-sensitized MIF transgenic (Tg) mice compared with their wild-type (WT) littermates. On the other hand, eosinophils were virtually absent from the skin of MIF knockout (KO) mice and failed to infiltrate their skin after repeated epicutaneous sensitization with OVA. The mRNA expression levels of eotaxin and IL-5 were significantly increased in OVA-sensitized skin sites of MIF Tg mice, but were significantly decreased in MIF KO mice in comparison with the levels in WT littermates. Eotaxin expression was induced by IL-4 stimulation in fibroblasts in MIF Tg mice, but not in MIF KO mice. These findings indicate that MIF can induce eosinophil accumulation in the skin. Therefore, the targeted inhibition of MIF might be a promising new therapeutic strategy for allergic skin diseases.

Link information
DOI
https://doi.org/10.1038/jid.2010.418
PubMed
https://www.ncbi.nlm.nih.gov/pubmed/21191413
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000289035800020&DestApp=WOS_CPL
ID information
  • DOI : 10.1038/jid.2010.418
  • ISSN : 0022-202X
  • Pubmed ID : 21191413
  • Web of Science ID : WOS:000289035800020

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