論文

査読有り
2017年

Influence of surface structure of n-type single-crystalline Si solar cells on potential-induced degradation

Solar Energy Materials and Solar Cells
  • Hara, Kohjiro
  • ,
  • Ogawa, Kinichi
  • ,
  • Okabayashi, Yusuke
  • ,
  • Matsuzaki, Hiroyuki
  • ,
  • Masuda, Atsushi

166
開始ページ
132
終了ページ
139
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1016/j.solmat.2017.03.018
出版者・発行元
ELSEVIER SCIENCE BV

Potential-induced degradation (PID) in photovoltaic (PV) modules based on n-type single-crystalline Si solar cells (a bifacial cell, interdigitated back contact cells, and a hetero junction (HJ) cell) was experimentally investigated by applying high voltages to the modules. The power output of a PV module with an n-type bifacial-front junction (FJ) Si solar cell decreased by about 17% by applying 1000 Vat 85 degrees C for 10 min, whereas no degradation was observed by applying +1000 V at 85 degrees C for 10 min. The spectrum of external quantum efficiency and transient absorption kinetics of the module after PID tests indicated that surface charge recombination between electron and hole on the Si cell was enhanced. ND in n-type Si PV modules can be approximately explained by surface polarization enhancing front surface recombination on Si cells, which corresponds to a loss of passivation effect by a silicon nitride (SiNx) layer. On the other hand, no PID was observed in a PV module with an n-type bifacial-rear junction (RJ) Si solar cell and a commercial PV module based on an HJ cell by applying both positive and negative voltages. High conductive layers of transparent conductive oxide (TCO) on the top of HJ Si solar cells would significantly effective to suppress PID in n-type Si PV modules.

リンク情報
DOI
https://doi.org/10.1016/j.solmat.2017.03.018
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000401208200017&DestApp=WOS_CPL
ID情報
  • DOI : 10.1016/j.solmat.2017.03.018
  • ISSN : 0927-0248
  • eISSN : 1879-3398
  • ORCIDのPut Code : 37950914
  • Web of Science ID : WOS:000401208200017

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