MISC

2003年2月

Observation of hydrogenated silicon clusters Si6Hx with controlled hydrogen content on Si(111)-(7 x 7) surfaces

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
  • N Uchida
  • ,
  • L Bolotov
  • ,
  • T Kanayama

42
2B
開始ページ
L204
終了ページ
L207
記述言語
英語
掲載種別
DOI
10.1143/JJAP.42.L204
出版者・発行元
INST PURE APPLIED PHYSICS

We studied how Si6Hx clusters behave on Si (111)-(7 x 7) surfaces depending on hydrogen content x by scanning tunneling microscopy. The Si6Hx+ ions were synthesized in an ion trap and deposited onto the (7 x 7) surfaces with an impact kinetic energy of 3 eV, i.e., 0.5 eV/Si atom, without decomposition. Deposited Si6H10-13 clusters favorably adsorbed on faulted halves of the (7 x 7) surfaces while Si6H0-5 clusters were randomly distributed. A clear difference of the electronic structure between Si6H0-5 and Si6H10-13 clusters was found in the tunneling spectra of the clusters.

Web of Science ® 被引用回数 : 5

リンク情報
DOI
https://doi.org/10.1143/JJAP.42.L204
CiNii Articles
http://ci.nii.ac.jp/naid/150000012480
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000184396100023&DestApp=WOS_CPL