論文

査読有り
2011年3月26日

Electrostatic potential fluctuations on oxide-passivated si(111) surfaces measured using integrated scanning probe microscopy

e-Journal of Surface Science and Nanotechnology
  • Leonid Bolotov
  • ,
  • Tetsuya Tada
  • ,
  • Masanori Iitake
  • ,
  • Masayasu Nishizawa
  • ,
  • Toshihiko Kanayama

9
開始ページ
117
終了ページ
121
記述言語
英語
掲載種別
研究論文(国際会議プロシーディングス)
DOI
10.1380/ejssnt.2011.117

Variations of the electrostatic potential were investigated for oxide-passivated n-Si(111) surfaces with atomically flat terraces by measuring the force acting on an ultra-sharp tungsten probe that was attached to the quartz resonator of an atomic force microscope. When the probe-sample gap maintained a constant tunneling current, an enhancement of electrostatic force with a lateral extent of ̃5 nm was observed around underlying donor atoms and charged defects. Additional variations of the surface potential and the probe-sample capacitance across the surface steps were associated with excess electric charge at the step edge. © 2011 The Surface Science Society of Japan.

リンク情報
DOI
https://doi.org/10.1380/ejssnt.2011.117
URL
http://www.scopus.com/inward/record.url?eid=2-s2.0-79954453424&partnerID=MN8TOARS
URL
http://orcid.org/0000-0002-8326-3708
ID情報
  • DOI : 10.1380/ejssnt.2011.117
  • ISSN : 1348-0391
  • ORCIDのPut Code : 20800872
  • SCOPUS ID : 79954453424

エクスポート
BibTeX RIS