論文

査読有り
2008年9月

Interaction of boric acid with salicyl derivatives as an anchor group of boron-selective adsorbents

POLYHEDRON
  • Yoshinobu Miyazaki
  • ,
  • Hidenobu Matsuo
  • ,
  • Takao Fujimori
  • ,
  • Hiroyuki Takemura
  • ,
  • Shiro Matsuoka
  • ,
  • Tadashi Okobira
  • ,
  • Kazuya Uezu
  • ,
  • Kazuhisa Yoshimura

27
13
開始ページ
2785
終了ページ
2790
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1016/j.poly.2008.06.007
出版者・発行元
PERGAMON-ELSEVIER SCIENCE LTD

The complexation ofboricacid with salicylic acid, salicyl alcohol and bis(hydroxymethyl)phenol derivatives has been investigated in detail using B-11 NMR spectroscopy. Boric acid accepts an electron pair through the nucleophilic attack of the ligand, followed by a condensation reaction, to form the 1: 1 monochelate complex. The monochelate complex then reacts with the ligand through the condensation reaction to give the 1:2 bischelate complex. Bis(hydroxymethyl)phenol derivatives formed quite stable chelate complexes among the examined salicyl derivatives. it was clarified by molecular modeling calculations that the complexation with bis(hydroxymethyl)phenol derivatives was highly favorable from an enthalpy viewpoint. An anion-exchange resin presorbed with 3,5-bis(hydroxymethyl)-4-hydroxybenzoate had a strong adsorbability of boron over a wide pH range. The adsorbent quantitatively removed boron up to approximately a half amount of the loaded ligand, which indicated that the boron species adsorbed onto the resin was predominantly present as the -3 charged 1:2 bischelate complex. The formation constant of the 1:2 bischelate complex with 3,5-bis(hydroxymethyl)-4-hydroxybenzoate in the resin phase was estimated to be log (beta) over bar (f(BLAc2)) = 5.0, which almost agreed with those of the salicyl alcohol derivatives in aqueous solutions. (C) 2008 Elsevier Ltd. All rights reserved.

リンク情報
DOI
https://doi.org/10.1016/j.poly.2008.06.007
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000259712800009&DestApp=WOS_CPL
ID情報
  • DOI : 10.1016/j.poly.2008.06.007
  • ISSN : 0277-5387
  • Web of Science ID : WOS:000259712800009

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