2009年6月
Photoreactive Chemisorbed Monolayer Suppressing Polymer Dewetting in Thermal Nanoimprint Lithography
LANGMUIR
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- ,
- ,
- 巻
- 25
- 号
- 12
- 開始ページ
- 6604
- 終了ページ
- 6606
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1021/la900902f
- 出版者・発行元
- AMER CHEMICAL SOC
We describe reactive-monolayer-assisted thermal nanoimprint lithography. The reactive monolayer inducing the graft reaction with thermoplastic poly(styrene) by ultraviolet light exposure was formed from 4-((10-mercaptodecyl)oxy)benzophenone on a gold thin film. The photochemical graft reaction suppressed the thermally induced dewetting of a poly(styrene) thin film on the modified gold surface. As a result, the poly(styrene) thin film used as a resist layer for wet etching could be patterned by thermal nanoimprint lithography, and 100-nm-scale patterns of a gold thin film could be prepared simply by wet etching.
- リンク情報
- ID情報
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- DOI : 10.1021/la900902f
- ISSN : 0743-7463
- Web of Science ID : WOS:000266929900004