論文

査読有り
2010年

Sinusoidal wavelength-scanning common-path interferometer with a beam-scanning system for measurement of film thickness variations

OPTICAL METROLOGY AND INSPECTION FOR INDUSTRIAL APPLICATIONS
  • Osami Sasaki
  • ,
  • Takafumi Morimatsu
  • ,
  • Samuel Choi
  • ,
  • Takamasa Suzuki

7855
記述言語
英語
掲載種別
研究論文(国際会議プロシーディングス)
DOI
10.1117/12.871030
出版者・発行元
SPIE-INT SOC OPTICAL ENGINEERING

Two light beams reflected from a front and rear surfaces of a glass film of 20 micron thickness interfere with each other in a common path interferometer. Sinusoidal wavelength-scanning light with the scanning amplitude of 5 nm and frequency of 15 KHz is used to generate a sinusoidal phase-modulated interference signal with the modulation amplitude of 2.6 rad. The phase of the interference signal provides the thickness variation of the film, whose measurement accuracy is a few nanometers. Moreover, in order to achieve a high spatial resolution and a wide measurement region a focused beam is scanned on the surface of the film with a rotating mirror.

リンク情報
DOI
https://doi.org/10.1117/12.871030
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000287663000023&DestApp=WOS_CPL
ID情報
  • DOI : 10.1117/12.871030
  • ISSN : 0277-786X
  • Web of Science ID : WOS:000287663000023

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