2010年
Sinusoidal wavelength-scanning common-path interferometer with a beam-scanning system for measurement of film thickness variations
OPTICAL METROLOGY AND INSPECTION FOR INDUSTRIAL APPLICATIONS
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- 巻
- 7855
- 号
- 記述言語
- 英語
- 掲載種別
- 研究論文(国際会議プロシーディングス)
- DOI
- 10.1117/12.871030
- 出版者・発行元
- SPIE-INT SOC OPTICAL ENGINEERING
Two light beams reflected from a front and rear surfaces of a glass film of 20 micron thickness interfere with each other in a common path interferometer. Sinusoidal wavelength-scanning light with the scanning amplitude of 5 nm and frequency of 15 KHz is used to generate a sinusoidal phase-modulated interference signal with the modulation amplitude of 2.6 rad. The phase of the interference signal provides the thickness variation of the film, whose measurement accuracy is a few nanometers. Moreover, in order to achieve a high spatial resolution and a wide measurement region a focused beam is scanned on the surface of the film with a rotating mirror.
- リンク情報
- ID情報
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- DOI : 10.1117/12.871030
- ISSN : 0277-786X
- Web of Science ID : WOS:000287663000023