2012年12月
SOIウェハの陽極接合法による可視光領域用マイクロファブリペロー干渉計
マイクロメカトロニクス
- ,
- ,
- 巻
- 56
- 号
- 207
- 開始ページ
- 1
- 終了ページ
- 9
- 記述言語
- 日本語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.20805/micromechatronics.56.207_1
- 出版者・発行元
- 日本時計学会
This paper reports on a micro Fabry-Perot interferometer (MFPI) fabricated by anodic bonding of an SOI wafer. Since we design optical and mechanical characteristics of the MFPI by using matrix method, our MFPI can be used in the wavelength ranging from visible light to near-infrared. The movable capacitor with the half mirror of the MFPI was fabricated on the SOI wafer, and this SOI wafer was bonded to the pyrex glass substrate by anodic bonding. The MFPI fabricated in this study can be used in wide wavelength ranging from 550 nm to 950 nm. It transmits the light from 10 to 80 % in that range. The gap of MFPI mirrors calculated by the peak wavelength of transmitting light was change from 1580 nm to 1270 nm by applying the voltage from 0 to 180 V.
- リンク情報
- ID情報
-
- DOI : 10.20805/micromechatronics.56.207_1
- ISSN : 1343-8565
- CiNii Articles ID : 110009561771
- CiNii Books ID : AA11646924