論文

査読有り
2019年4月

Estimation of Ga adatom diffusion length for GaP growth by molecular beam epitaxy

Journal of Crystal Growth
  • Jose A. Piedra-Lorenzana
  • ,
  • Keisuke Yamane
  • ,
  • Koki Shiota
  • ,
  • Junya Fujimoto
  • ,
  • Shunsuke Tanaka
  • ,
  • Hiroto Sekiguchi
  • ,
  • Hiroshi Okada
  • ,
  • Akihiro Wakahara

512
開始ページ
37
終了ページ
40
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1016/j.jcrysgro.2019.02.008
出版者・発行元
Elsevier {BV}

© 2019 In this work Ga adatom incorporation diffusion length was quantified in two different directions, 〈1 1 0〉 and <11¯0> during MBE growth of a GaP layer. Thickness distribution was measured for the GaP layer grown on striped patterned GaP substrate and the data was analyzed based on a one-dimensional diffusion growth model between two different adjacent facets. It was quantitatively revealed that the diffusion length of the Ga adatoms increased with growth temperature and an anisotropy in the diffusion length was observed along <110> and <11¯0> directions. The influence in the morphology due to the diffusion length anisotropy was discussed with the RHEED patterns.

リンク情報
DOI
https://doi.org/10.1016/j.jcrysgro.2019.02.008
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000460040600007&DestApp=WOS_CPL
Scopus
https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85061174788&origin=inward
Scopus Citedby
https://www.scopus.com/inward/citedby.uri?partnerID=HzOxMe3b&scp=85061174788&origin=inward
URL
http://orcid.org/0000-0002-0692-9975
ID情報
  • DOI : 10.1016/j.jcrysgro.2019.02.008
  • ISSN : 0022-0248
  • ORCIDのPut Code : 55971577
  • SCOPUS ID : 85061174788
  • Web of Science ID : WOS:000460040600007

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