古室昌徳 (Masanori Komuro) - マイポータル

基本情報

所属: 独立行政法人産業技術総合研究所つくばセンター

学位: 理学博士

J-GLOBAL ID: 200901006218220521
researchmap会員ID: 5000086616

外部リンク: http://www.aist.go.jp/RESEARCHERDB/cgi-bin/worker_detail.cgi?call=namae&rw_id=M82577733

MISC

Step-and-repeat photo-nanoimprint system using active orientation head

H Hiroshima, M Komuro, Y Kurashima, SH Kim, T Muneishi

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 43(6B) 4012-4016 2004年6月
Fabrication of low line edge roughness mold for photo-nanoimprint

Y Kurashima, H Hiroshima, M Komuro, SH Kim, N Yamazaki, J Taniguchi, Miyamoto, I, H Namatsu, S Matsui

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 43(6B) 4045-4049 2004年6月
Reducing photocurable polymer pattern shrinkage and roughness during dry etching in photo-nanoimprint lithography

SH Kim, H Hiroshima, S Inoue, Y Kurashima, M Komuro

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 43(6B) 4022-4026 2004年6月
Fabrication of trilayer resist using photocuring-imprint lithography

SH Kim, H Hiroshima, S Inoue, Y Kurashima, M Komuro

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 21(6) 3144-3148 2003年11月
Evaluation of line edge roughness in nanoimprint lithography using photocurable polymer

Y Kurashima, M Komuro, H Hiroshima, J Taniguchi, Miyamoto, I

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 42(6B) 3871-3873 2003年6月
Elimination of pattern defects of nanoimprint under atmospheric conditions

H Hiroshima, M Komuro, N Kasahara, Y Kurashima, J Taniguchi

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 42(6B) 3849-3853 2003年6月
Improvement of imprinted pattern uniformity using sapphire mold

M Komuro, Y Tokano, J Taniguchi, T Kawasaki, Miyamoto, I, H Hiroshima

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 41(6B) 4182-4185 2002年6月
Uniformity in patterns imprinted using photo-curable liquid polymer

H Hiroshima, S Inoue, N Kasahara, J Taniguchi, Miyamoto, I, M Komuro

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 41(6B) 4173-4177 2002年6月
Lithographic properties of positive photosensitive polyimide insulator by block copolymerization

Taro Itatani, Masanori Komuro, Masahiro Aoyagi, Bun-Sil Jung, Shigemasa Segawa, Hiroshi Itatani, Masataka Miyamura, Shunichi Matsumoto

Journal of Photopolymer Science and Technology 14(1) 61-66 2001年