論文

査読有り
2012年

Ultraviolet light emitting devices using AlGdN

Materials Research Society Symposium Proceedings
  • Takashi Kita
  • ,
  • Shinya Kitayama
  • ,
  • Tsuguo Ishihara
  • ,
  • Hirokazu Izumi
  • ,
  • Yoshitaka Chigi
  • ,
  • Tetsuro Nishimoto
  • ,
  • Hiroyuki Tanaka
  • ,
  • Mikihiro Kobayashi

1342
開始ページ
87
終了ページ
92
記述言語
英語
掲載種別
研究論文(国際会議プロシーディングス)
DOI
10.1557/opl.2011.998

We developed ultra-violet field-emission devices using rare-earth nitrides of Al 1-xGd xN grown by a reactive radio-frequency magnetron sputtering technique. The Al 1-xGd xN phosphor film excited by high-energy electrons shows a resolution limited, narrow intra-orbital luminescence from Gd 3+ ions at 318 nm. The devise characteristics depend on injected current and acceleration voltage, which were analyzed by considering multiple excitation process of injected high-energy electrons. © 2011 Materials Research Society.

リンク情報
DOI
https://doi.org/10.1557/opl.2011.998
ID情報
  • DOI : 10.1557/opl.2011.998
  • ISSN : 0272-9172
  • SCOPUS ID : 84455181531

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