2012年
Ultraviolet light emitting devices using AlGdN
Materials Research Society Symposium Proceedings
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- 巻
- 1342
- 号
- 開始ページ
- 87
- 終了ページ
- 92
- 記述言語
- 英語
- 掲載種別
- 研究論文(国際会議プロシーディングス)
- DOI
- 10.1557/opl.2011.998
We developed ultra-violet field-emission devices using rare-earth nitrides of Al 1-xGd xN grown by a reactive radio-frequency magnetron sputtering technique. The Al 1-xGd xN phosphor film excited by high-energy electrons shows a resolution limited, narrow intra-orbital luminescence from Gd 3+ ions at 318 nm. The devise characteristics depend on injected current and acceleration voltage, which were analyzed by considering multiple excitation process of injected high-energy electrons. © 2011 Materials Research Society.
- リンク情報
- ID情報
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- DOI : 10.1557/opl.2011.998
- ISSN : 0272-9172
- SCOPUS ID : 84455181531