MISC

2004年8月

A novel process utilizing subcritical water to remove lead from wasted lead silicate glass

CHEMISTRY LETTERS
  • H Miyoshi
  • ,
  • DP Chen
  • ,
  • T Akai

33
8
開始ページ
956
終了ページ
957
記述言語
英語
掲載種別
DOI
10.1246/cl.2004.956
出版者・発行元
CHEMICAL SOC JAPAN

Lead was removed from lead silicate glass 7.3Na(2)O-6.4K(2)O-3.7MgO-5.4CaO-66.4SiO(2)-7.8PbO-3A1(2)O(3) (mol %), used in color television CRT funnel, utilizing a subcritical hydrothermal treatment at 628 K and 24 MPa followed by acid leaching at 373 K. This process may be used to prevent disposal of lead containing waste glass wares to landfills, reduce environmental risks in future.

リンク情報
DOI
https://doi.org/10.1246/cl.2004.956
CiNii Articles
http://ci.nii.ac.jp/naid/10013447304
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000223604900004&DestApp=WOS_CPL
ID情報
  • DOI : 10.1246/cl.2004.956
  • ISSN : 0366-7022
  • eISSN : 1348-0715
  • CiNii Articles ID : 10013447304
  • Web of Science ID : WOS:000223604900004

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