論文

査読有り
2004年10月

Characteristics of nano-electrostatic actuator fabricated by focused ion beam chemical vapor deposition

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
  • R Kometani
  • ,
  • T Hoshino
  • ,
  • K Kondo
  • ,
  • K Kanda
  • ,
  • Y Haruyama
  • ,
  • T Kaito
  • ,
  • J Fujita
  • ,
  • M Ishida
  • ,
  • Y Ochiai
  • ,
  • S Matsui

43
10
開始ページ
7187
終了ページ
7191
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1143/JJAP.43.7187
出版者・発行元
INST PURE APPLIED PHYSICS

The three-dimensional (3D) nanostructure fabrication technology using focused ion beam chemical vapor deposition (FIB-CVD) is very effective for highly efficient 3D nanomechanical device fabrication. We can fabricate 3D nanostructure easily and freely with this fabrication technology using FIB-CVD. Here, we demonstrate the fabrication of various 3-D nano-electrostatic actuators and manipulators on a glass capillary by 30 keV Ga+ focused-ion-beam-assisted deposition with phenanthrene vapor as a precursor, and the operation of these actuators and manipulators by applying voltage onto a Au-coated glass capillary under an optical microscope is shown. Furthermore, the structural characteristics and functionalities of them are described in this paper.

Web of Science ® 被引用回数 : 16

リンク情報
DOI
https://doi.org/10.1143/JJAP.43.7187
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000224780300073&DestApp=WOS_CPL
ID情報
  • DOI : 10.1143/JJAP.43.7187
  • ISSN : 0021-4922
  • Web of Science ID : WOS:000224780300073

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