森田瑞穂 (Mizuho Morita) - マイポータル

基本情報

所属: 大阪大学大学院工学研究科精密科学・応用物理学専攻教授

学位: 工学博士(東北大学)

J-GLOBAL ID: 200901055133286354
researchmap会員ID: 1000004932

研究キーワード

研究分野

MISC

491

Selective Adsorption of Organosilane Molecules Along Step Edges of Atomically Flattened Si(111) Surfaces

Hiroki Sakane, Akina Yoshimatsu, Takushi Shigetoshi, Junichi Uchikoshi, Mizuho Morita, Kenta Arima

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY 11(4) 2962-2967 2011年4月
Characterization of Terraces and Steps on Cl-Terminated Ge(111) Surfaces After HCl Treatment in N-2 Ambient

Katsuya Dei, Tatsuya Kawase, Kazufumi Yoneda, Junichi Uchikoshi, Mizuho Morita, Kenta Arima

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY 11(4) 2968-2972 2011年4月
Characterization of Terraces and Steps on Cl-Terminated Ge(111) Surfaces After HCl Treatment in N-2 Ambient

Katsuya Dei, Tatsuya Kawase, Kazufumi Yoneda, Junichi Uchikoshi, Mizuho Morita, Kenta Arima

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY 11(4) 2968-2972 2011年4月
Selective Adsorption of Organosilane Molecules Along Step Edges of Atomically Flattened Si(111) Surfaces

Hiroki Sakane, Akina Yoshimatsu, Takushi Shigetoshi, Junichi Uchikoshi, Mizuho Morita, Kenta Arima

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY 11(4) 2962-2967 2011年4月
Formation of Pyramidal-shaped Etch Pits on Germanium Surfaces Using Catalytic Reactions with Metallic Nanoparticles in Water

Extended Abstracts of the 2010 International Conference on Solid State Devices and Materials 1301-1302 2010年
Mechanism of Anisotropic Etching of Germanium Surface with Metallic Nanoparticles in Water

Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 158-159 2010年
Dependence of Miscut Angles on Straightness of Step Edges of Si(111) Surfaces Flattened by Ultra-low Dissolved Oxygen Water

Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 106-107 2010年
Sensing of DNA Solution by Silicon-Oxide-Gap-Oxide-Silicon Structure

Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology pp.88-89 2010年
Consideration of photo-etching mechanism of Si with N-fluoropyridinium salt

Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology pp.110-111 2010年
Photoetching of Silicon by N-Fluoropyridinium Salt

Kentaro Tsukamoto, Junichi Uchikoshi, Shigeharu Goto, Tatsuya Kawase, Noritaka Ajari, Takabumi Nagai, Kenji Adachi, Kenta Arima, Mizuho Morita

ELECTROCHEMICAL AND SOLID STATE LETTERS 13(11) D80-D82 2010年
Photonic and Biosensing Devices Using Silicon Technologies

Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology pp.40-41 2010年
Electroluminescence in Metal-Oxide-Semiconductor Tunnel Diodes on Ultrathin Silicon-on-Insulator Substrates

Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology pp.94-95 2010年
Electrical Characterization of DNA Solutions Using Metal-Gap-Insulator-Semiconductor Devices

Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology pp.90-91 2010年
Electroluminescence in Metal-Oxide-Semiconductor Tunnel Diodes with a Silicon Nano-layer

Mizuho Morita, Kei Matsumura, Ryuta Yamada, Junichi Uchikoshi, Kenta Arima

NANOSCALE LUMINESCENT MATERIALS 28(3) 279-284 2010年
Formation of Pyramidal-shaped Etch Pits on Germanium Surfaces Using Catalytic Reactions with Metallic Nanoparticles in Water

Extended Abstracts of the 2010 International Conference on Solid State Devices and Materials 1301-1302 2010年
Electrical Characterization of DNA Solutions Using Metal-Gap-Insulator-Semiconductor Devices

Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology pp.90-91 2010年
Mechanism of Anisotropic Etching of Germanium Surface with Metallic Nanoparticles in Water

Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 158-159 2010年
Dependence of Miscut Angles on Straightness of Step Edges of Si(111) Surfaces Flattened by Ultra-low Dissolved Oxygen Water

Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology 106-107 2010年
Sensing of DNA Solution by Silicon-Oxide-Gap-Oxide-Silicon Structure

Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology pp.88-89 2010年
Consideration of photo-etching mechanism of Si with N-fluoropyridinium salt

Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology pp.110-111 2010年

もっとみる

所属学協会

Works(作品等)

もっとみる

共同研究・競争的資金等の研究課題

半導体表面界面物性の研究

科学研究費補助金 1997年
半導体デバイス・プロセスに関する研究

科学研究費補助金 1997年
Study on Semiconductor Surface and Interface Physics

Grant-in-Aid for Scientific Research 1997年
Study on Semiconductor Devices and Processes

Grant-in-Aid for Scientific Research 1997年

森田瑞穂

基本情報

研究キーワード

研究分野

MISC

所属学協会

Works(作品等)

共同研究・競争的資金等の研究課題

産業財産権

メニュー