MISC

査読有り
2008年3月

Improvement of emission efficiency of nanocrystalline silicon planar cathodes

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
  • Hidetaka Shimawaki
  • ,
  • Yochiro Neo
  • ,
  • Hidenori Mimura
  • ,
  • Katsuhisa Murakami
  • ,
  • Fujio Wakaya
  • ,
  • Mikio Takai

26
2
開始ページ
864
終了ページ
867
記述言語
英語
掲載種別
DOI
10.1116/1.2839886
出版者・発行元
A V S AMER INST PHYSICS

A planar cathode based on nanocrystalline Si covered with a thin oxide film was fabricated and the emission characteristics were examined. The electron emission occurred at the gate voltage higher than the work function of the Au gate, and the emission efficiency was improved up to 4% by reducing the thickness of the Au electrode. A lot of nanoholes in the thin Au film were observed, suggesting emission included electrons directly emitted from nanocrystalline aligned under nanoholes. The energy distribution of the emitted electron and the emission angle of the cathode are also discussed. (c) 2008 American Vacuum Society.

Web of Science ® 被引用回数 : 10

リンク情報
DOI
https://doi.org/10.1116/1.2839886
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000254600600074&DestApp=WOS_CPL

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