MISC

2008年11月

Noise analysis and design optimization due to pattern processing in perpendicular patterned media

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
  • Kenji Miura
  • ,
  • Yusuke Murakami
  • ,
  • Hajime Aoi
  • ,
  • Hiroaki Muraoka
  • ,
  • Yoshihisa Nakamura

320
22
開始ページ
2904
終了ページ
2907
記述言語
英語
掲載種別
DOI
10.1016/j.jmmm.2008.08.061
出版者・発行元
ELSEVIER SCIENCE BV

In patterned media, shape characteristics of dots due to processing fluctuation and resolution will become the main source of the noise. The noise due to the roughness of edge line and roundness by the lithographical resolution was analyzed in this paper. Firstly, edge line roughness was re-created by the method in the semiconductor field, and dot physical pattern was generated. We added the physical pattern roundness due to lithographical resolution varied with the ratio of decreased area by over etching. The result indicated those noise sources caused fatal errors. The processing guidance of the dot was formulated. (C) 2008 Elsevier B. V. All rights reserved.

リンク情報
DOI
https://doi.org/10.1016/j.jmmm.2008.08.061
CiNii Articles
http://ci.nii.ac.jp/naid/80019955656
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000260137800013&DestApp=WOS_CPL
ID情報
  • DOI : 10.1016/j.jmmm.2008.08.061
  • ISSN : 0304-8853
  • CiNii Articles ID : 80019955656
  • Web of Science ID : WOS:000260137800013

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