2008年11月
Noise analysis and design optimization due to pattern processing in perpendicular patterned media
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
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- 巻
- 320
- 号
- 22
- 開始ページ
- 2904
- 終了ページ
- 2907
- 記述言語
- 英語
- 掲載種別
- DOI
- 10.1016/j.jmmm.2008.08.061
- 出版者・発行元
- ELSEVIER SCIENCE BV
In patterned media, shape characteristics of dots due to processing fluctuation and resolution will become the main source of the noise. The noise due to the roughness of edge line and roundness by the lithographical resolution was analyzed in this paper. Firstly, edge line roughness was re-created by the method in the semiconductor field, and dot physical pattern was generated. We added the physical pattern roundness due to lithographical resolution varied with the ratio of decreased area by over etching. The result indicated those noise sources caused fatal errors. The processing guidance of the dot was formulated. (C) 2008 Elsevier B. V. All rights reserved.
- リンク情報
- ID情報
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- DOI : 10.1016/j.jmmm.2008.08.061
- ISSN : 0304-8853
- CiNii Articles ID : 80019955656
- Web of Science ID : WOS:000260137800013