SUGITA Kazuyuki

J-GLOBAL         Last updated: Aug 9, 2010 at 00:00
 
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Name
SUGITA Kazuyuki
Affiliation
Former Institution / Organization Chiba University Faculty of Engineering Department of Applied Chemistry and Biotechnology
Job title
Professor
Degree
Doctor of Engineering(The University of Tokyo)

Research Areas

 
 

Academic & Professional Experience

 
1968
 - 
1975
Res. Assoc., Fac. Eng., Chiba Univ.
 
1973
 - 
1975
Univ. of Toronto, Dept. of Chem. Postdoc.
 
1975
 - 
1989
Assoc. Prof., Fac. Eng., Chiba Univ.
 
1989
   
 
- Ontario Research Center for Mat. Sci., Visiting Scientist
 
1989
   
 
- Professor, Fac. Eng., Chiba Univ.
 

Education

 
 
 - 
1968
Synthetic Chemistry, Graduate School, Division of Engineering, The University of Tokyo
 
 
 - 
1962
Industrial Chemistry, Faculty of Engineering, The University of Tokyo
 

Misc

 
Photochemistry of Ketone Polymers. XII. Studies of Ring - Substituted Phenyl Isopropenyl Ketones and Their Styrene Copolymers(jointly worked)
J. of Polymer Sci. Polymer Chemistry Ed.   14(8) 1901   1976
Thickness Dependence of Etching Rate in Dry Photoetching of Organic Resists(jointly worked)
Japansese Journal of Applied Physics   25(9) 1455   1986
Kieko HARADA, Nobuo UENO, Kazuyuki SUGITA
Kobunshi Ronbunshu   45(4) 295-302   1988

Books etc

 
Mechanism of UV - and VUV-Induced Etching of Poly(methyl methacrylate)(jointly worked)
Polymers in Microlithography (ACS Symp. Ser. #412 Amer. Chem. Soc. )   1989   
Highly Photosensitive Diazo Compounds as Photoacid Generators for Chemically Amplified Resists(jointly worked)
Micro- and Nanopatterning Polymers(ACS Symp. Ser. #706)   1998   
Surface Imaging-Targeting the formation of a finer pattern than the wavelength of the transferring light
New Process and Materials for Semiconductor Device Manufacturing.   2000   
A Surface-Sylilated Single-Layer Resist Using Chemical Amplification for DUV Lithography: Limited Permeation of Si Compounds from Vapor and Liquid Phases,Forefront of Lithographic Materials Research
Proc. of 12th Intern'l Conf. on Photopolymers, Oct. 16-18, 2000, McAfee, NJ, USA), Eds. H. Ito, M. M. Khojasteh and W. Li, (Soc. of Plastics Eng., Mid-Hudson Section, Hopewell Junction, NY, 2001)   2001   
A Surface-Silylated Single-Layer Resist Using Chemical Amplification for DUV Lithography: Ⅲ. Preliminary Results of Optimization of PAG and Its Content
Proc. of 13th Inter'l Conf. on Photopolymers(Oct. 20-22,2003,Taminent,PA,USA),Eds. H. Ito,P.R. Varanasi, M. M. Khojasteh, and R. Chen,(Soc. Plastics Eng. Inc., Mid Hudson Section, Hopewell Junction, NY,2004)   2004   

Works

 
Resist Pattern Formation by Surface Imaging
2000 - 2004

Research Grants & Projects

 
Perfomance Enhancement of Resists for Microlithography
R and D Funds to Encourage Competition among Research Institutes
Project Year: 1987   
Preparation of Novel Photodegradable Polymers and Their Application to Information Recording
Project Year: 1973   
Perfomance Enhancement of Resists for Microlithography
Preparation of Novel Photodegradable Polymers and Their Application to Information Recording