MIKI Hidejiro

J-GLOBAL         Last updated: Sep 12, 2013 at 11:28
 
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Name
MIKI Hidejiro
Degree
Doctor of Engineering(Osaka University)

Research Interests

 
 

Research Areas

 
 

Academic & Professional Experience

 
 
   
 
Professor, Ritsumeikan University Research Organization of Science and Engineering, Research Organization of Science and Engineering
 

Education

 
 
 - 
1959
Faculty of Science, Osaka University
 

Misc

 
Direct Writing of Silicon Lines by Pyrolite ArgonLaser CVD
26,1830   1986
INFLUENCE OF UNSYMMETRICAL ELECTRODE STRUCTURE ON a-Si PHOTODIODE CHARACTERISTICS
70,689   1986
Characteristics of Hydrogenated Amorphous Silicon Films Prepared by Cyclotron Resonance Microwave Plasma Chemical Vapor Deposition Method and Their Apprication to Photodiodes
Jpn.J.Appl.Phys.The Japan Society of Applied Physics   26(2) 202   1987
LARGE SCALF AND LARGE AREA AMORPHOUS SILICON THIN FILM TRANSISTOR AR-RAYS FOR ACTIVE MATRIX LIQUID CRYSTAL DISPLAYS
Mat.Res.Soc.Symp.Proc.Material Research Society   95   1987
CHARACTERISTICS ANALYSIS OF ACTIVE MATRIX LC DISPLAY COMPOSED OF a-Si TFTs
28,131   1987

Conference Activities & Talks

 
Crystalline fullerene thin films prepared at room temperature by synchrotoron radiation ablation
2003   
Deposition of Diamond-Like Carbon Thin Films by Synchroton Radiation Ablation
2002   
Deposition of Fullerene and Carbon nanotube Thin Films by Synchrotron Radiation Ablation
2001   
A new phase of Bi - Sr - Ca - Cu - O compound
8th CIMTEC (Forum on New Materials)   1994   
AN EXPERIMENT ON DEPOSITION OF HETEROCYCLIC COMPOUND THIN FILMS USING SYNCHROTRON RADIATION ABLATION
1999   

Research Grants & Projects

 
Single-electron devices
Preparation of functional thin films using synchrotron radiation ablation

Patents

 
METHOD FOR GROWING CRYSTAL OF 3-5 COMPOUND SEMICONDUCTORS
USP 4,004,953 及びEPC 1,473,485
ダイヤモンド合成方法及びその装置
特開平10-236898
気相成長装置
登録1116294
拡散ポンプの冷却バッフル
登録880597
熱電素子の電極固着方法
登録481599