2014年6月
Significant enhancement of thermoelectric properties and metallization of Al-doped Mg2Si under pressure
JOURNAL OF APPLIED PHYSICS
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- 巻
- 115
- 号
- 21
- 開始ページ
- 213705-1
- 終了ページ
- 213705-9
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1063/1.4881015
- 出版者・発行元
- AMER INST PHYSICS
We report results of investigations of electronic transport properties and lattice dynamics of Al-doped magnesium silicide (Mg2Si) thermoelectrics at ambient and high pressures to and beyond 15 GPa. High-quality samples of Mg2Si doped with 1 at. % of Al were prepared by spark plasma sintering technique. The samples were extensively examined at ambient pressure conditions by X-ray diffraction studies, Raman spectroscopy, electrical resistivity, magnetoresistance, Hall effect, thermoelectric power (Seebeck effect), and thermal conductivity. A Kondo-like feature in the electrical resistivity curves at low temperatures indicates a possible magnetism in the samples. The absolute values of the thermopower and electrical resistivity, and Raman spectra intensity of Mg2Si:Al dramatically diminished upon room-temperature compression. The calculated thermoelectric power factor of Mg2Si:Al raised with pressure to 2-3 GPa peaking in the maximum the values as high as about 8 x 10(-3) W/(K(2)m) and then gradually decreased with further compression. Raman spectroscopy studies indicated the crossovers near similar to 5-7 and similar to 11-12 GPa that are likely related to phase transitions. The data gathered suggest that Mg2Si: Al is metallized under moderate pressures between similar to 5 and 12 GPa. (C) 2014 AIP Publishing LLC.
- リンク情報
- ID情報
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- DOI : 10.1063/1.4881015
- ISSN : 0021-8979
- eISSN : 1089-7550
- Web of Science ID : WOS:000337161600031