論文

査読有り
2014年6月

Significant enhancement of thermoelectric properties and metallization of Al-doped Mg2Si under pressure

JOURNAL OF APPLIED PHYSICS
  • Natalia V. Morozova
  • ,
  • Sergey V. Ovsyannikov
  • ,
  • Igor V. Korobeinikov
  • ,
  • Alexander E. Karkin
  • ,
  • Ken-ichi Takarabe
  • ,
  • Yoshihisa Mori
  • ,
  • Shigeyuki Nakamura
  • ,
  • Vladimir V. Shchennikov

115
21
開始ページ
213705-1
終了ページ
213705-9
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1063/1.4881015
出版者・発行元
AMER INST PHYSICS

We report results of investigations of electronic transport properties and lattice dynamics of Al-doped magnesium silicide (Mg2Si) thermoelectrics at ambient and high pressures to and beyond 15 GPa. High-quality samples of Mg2Si doped with 1 at. % of Al were prepared by spark plasma sintering technique. The samples were extensively examined at ambient pressure conditions by X-ray diffraction studies, Raman spectroscopy, electrical resistivity, magnetoresistance, Hall effect, thermoelectric power (Seebeck effect), and thermal conductivity. A Kondo-like feature in the electrical resistivity curves at low temperatures indicates a possible magnetism in the samples. The absolute values of the thermopower and electrical resistivity, and Raman spectra intensity of Mg2Si:Al dramatically diminished upon room-temperature compression. The calculated thermoelectric power factor of Mg2Si:Al raised with pressure to 2-3 GPa peaking in the maximum the values as high as about 8 x 10(-3) W/(K(2)m) and then gradually decreased with further compression. Raman spectroscopy studies indicated the crossovers near similar to 5-7 and similar to 11-12 GPa that are likely related to phase transitions. The data gathered suggest that Mg2Si: Al is metallized under moderate pressures between similar to 5 and 12 GPa. (C) 2014 AIP Publishing LLC.

リンク情報
DOI
https://doi.org/10.1063/1.4881015
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000337161600031&DestApp=WOS_CPL
ID情報
  • DOI : 10.1063/1.4881015
  • ISSN : 0021-8979
  • eISSN : 1089-7550
  • Web of Science ID : WOS:000337161600031

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