MISC

2003年8月

Engineering prospects of negative-ion-based neutral beam injection system from high power operation for the large helical device

NUCLEAR FUSION
  • O Kaneko
  • ,
  • Y Takeiri
  • ,
  • K Tsumori
  • ,
  • Y Oka
  • ,
  • M Osakabe
  • ,
  • K Ikeda
  • ,
  • K Nagaoka
  • ,
  • T Kawamoto
  • ,
  • E Asano
  • ,
  • M Sato

43
8
開始ページ
692
終了ページ
699
記述言語
英語
掲載種別
DOI
10.1088/0029-5515/43/8/309
出版者・発行元
INT ATOMIC ENERGY AGENCY

The five-year operation of the negative-ion-based neutral beam injector (N-NBI) system on the large helical device (LHD) is reviewed, and the prospects of negative-ion technology for applying it to future helical fusion reactors are discussed from these experiences. The N-NBI system was designed and constructed based on the results of R&D at NIFS. Using three beamlines, the total port-through injection power of 10.3 MW for 2 s has been achieved. Each beamline attained almost the same performance: similar to3.5 MW of the port-through power with the beam energy of similar to165 keV for hydrogen, which corresponds to the averaged negative ion current density of 25 mA cm(-2) from each ion source. Recent modification of accelerators in one of the beamlines was very successful to increase beam energy up to 180 keV and port-through power, 4.4 MW. Long pulse injection heating was also pursued under the steady state LHD operation, and 110 s for 0.1 MW by one ion source, and 80 s for 0.5 MW by two ion sources (one beamline) were achieved. These facts show that the negative ion technology has been established to the same power level of conventional positive ion systems. Several technical improvements needed for obtaining these successful results are described, and the problems that limit the present performance are clarified. Some results of recent R&D to solve these problems are shown.

リンク情報
DOI
https://doi.org/10.1088/0029-5515/43/8/309
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000185180800009&DestApp=WOS_CPL
ID情報
  • DOI : 10.1088/0029-5515/43/8/309
  • ISSN : 0029-5515
  • Web of Science ID : WOS:000185180800009

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