佐々木 公洋

Crystalline and Thermoelectrical Properties of Si/GeB Multilayers Prepared with Si Buffer Layer And SiO2 Substrates 

48 2009年  

Crystalline and Thermoelectrical Properties of Si/GeB Multilayers Prepared with Si Buffer Layer And SiO2 Substrates 

48 2009年  

Improvement of dielectric properties of ZrO2 films prepared by limited reaction sputtering 

2008年  

Strain and surface roughness control of SiGe layer deposited by ion beam sputtering 

2008年  

基礎からの半導体デバイス 

日新出版 2008年  

Improvement of dielectric properties of ZrO2 films prepared by limited reaction sputtering 

2008年  

Strain and surface roughness control of SiGe layer deposited by ion beam sputtering 

2008年  

Preparation of ZrO2 Ultrathin Films as Gate Dielectrics by Reactive DC Magnetron Sputtering 

pp.103-104 2007年  

Preparation of ZrO2 Ultrathin Films as Gate Dielectrics by Reactive DC Magnetron Sputtering 

pp.103-104 2007年  

Future Textiles 

繊維社 2006年  

基礎からの電磁気学 

日新出版 2006年  

Future Textiles 

2006年  

Silicon Epitaxial Growth by ECR Plasma Assisted RF Sputtering 

Proc. of 6th International Symposium of Sputtering and Plasma Processes 265-268 2001年  

Metallic Mode Growth of ZrO2-Based Thin Films for Gate Insulator Using Reactive Sputtering Technique 

2001 Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices 93-97 2001年  

Limited Reaction Growth of YSZ (ZrO2:Y2O3) Thin Films for Gate Insulator 

Proc. of 6th International Symposium of Sputtering and Plasma Processes 41-44 2001年