MISC

1999年4月

Bismuth-induced surface structure of Si(100) studied by scanning tunneling microscopy

APPLIED SURFACE SCIENCE
  • M Naitoh
  • ,
  • H Shimaya
  • ,
  • S Nishigaki
  • ,
  • N Oishi
  • ,
  • F Shoji

142
1-4
開始ページ
38
終了ページ
42
記述言語
英語
掲載種別
DOI
10.1016/S0169-4332(98)00635-7
出版者・発行元
ELSEVIER SCIENCE BV

We report results of a scanning tunneling microscopy investigation of the bismuth-induced structures at Si(100) surfaces. Long linear chains of bismuth dimers are formed on the Si(100) surface after bismuth deposition at 480 degrees C. This may be self-organized by an enhanced migration of atoms along the chains. Moreover, bismuth atoms adsorbed on the surface induce, by expelling silicon atoms from the substrate surface, a (2 x n) restructuring with linear defects perpendicular to the dimer rows on the Si terrace, (C) 1999 Elsevier Science B.V. All rights reserved.

リンク情報
DOI
https://doi.org/10.1016/S0169-4332(98)00635-7
CiNii Articles
http://ci.nii.ac.jp/naid/80011069517
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000080163900009&DestApp=WOS_CPL
ID情報
  • DOI : 10.1016/S0169-4332(98)00635-7
  • ISSN : 0169-4332
  • CiNii Articles ID : 80011069517
  • Web of Science ID : WOS:000080163900009

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