2001年5月
Numerical feasibility study of the fabrication of subwavelength structure by mask lithography
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION
- ,
- 巻
- 18
- 号
- 5
- 開始ページ
- 1093
- 終了ページ
- 1100
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1364/JOSAA.18.001093
- 出版者・発行元
- OPTICAL SOC AMER
Electromagnetic diffraction of a light wave by a single aperture of subwavelength width and subsequent propagation in a lossy medium are numerically investigated. This diffraction problem simulates exposure of a resist with an amplitude mask. It is found that there is the possibility of fabricating a lambda /2 structure on a resist of lambda /4 thickness, where lambda is the wavelength of the exposing light in vacuum, by conventional contact or by proximity lithography. It is also found that an air gap between a mask and a resist of up to lambda /2 does not have a significant effect on resolution. This approach permits easy and cost-effective fabrication of subwavelength structures and leads to wide availability of diffractive optical elements in the nonscalar domain. (C) 2001 Optical Society of America.
- リンク情報
- ID情報
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- DOI : 10.1364/JOSAA.18.001093
- ISSN : 0740-3232
- Web of Science ID : WOS:000168310400011