1998年11月
Effect of external magnetic field on c-axis orientation and residual stress in AlN films
THIN SOLID FILMS
- ,
- ,
- ,
- 巻
- 332
- 号
- 1-2
- 開始ページ
- 247
- 終了ページ
- 251
- 記述言語
- 英語
- 掲載種別
- DOI
- 10.1016/S0040-6090(98)01095-5
- 出版者・発行元
- ELSEVIER SCIENCE SA
Crystal orientation and residual stress development in AIN films on borosilicate glass (the thermal expansion coefficient of which is nearly equal to that of AlN) substrate were investigated by atomic force microscopy (AFM) observation and X-ray diffraction method. The AlN films were prepared by a planar magnetron sputtering system with two opposite targets under the condition of constant nitrogen gas pressure, constant substrate temperature, various deposition time and various external magnetic field (EM) between 63 and 128 gauss. We obtain the following results: (1) the size of crystal grains was large and the value of FWHM of 00.2 diffraction line was small at large EM; (2) the c-axis orientation was good for all films; (3) the large tensile residual stresses were obtained at large EM and decreased with decreasing the EM because of ion peening. (C) 1998 Elsevier Science S.A. All rights reserved.
- リンク情報
- ID情報
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- DOI : 10.1016/S0040-6090(98)01095-5
- ISSN : 0040-6090
- CiNii Articles ID : 80010727232
- Web of Science ID : WOS:000077202500045