2002年
Effect of Sputtering Gas Pressure and Nitrogen Concentration on Crystal Orientation and Residual Stress in Sputtered AlN Films
Vacuum
- 巻
- 661(), 441-446
- 号
- DOI
- 10.1016/S0042-207X(02)00168-9
- ID情報
-
- DOI : 10.1016/S0042-207X(02)00168-9