MISC

2002年

Effect of Sputtering Gas Pressure and Nitrogen Concentration on Crystal Orientation and Residual Stress in Sputtered AlN Films

Vacuum

661(), 441-446
DOI
10.1016/S0042-207X(02)00168-9

リンク情報
DOI
https://doi.org/10.1016/S0042-207X(02)00168-9
ID情報
  • DOI : 10.1016/S0042-207X(02)00168-9

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