High Rate Deposition of Ta-doped SnO2(TTO) by Reactive Sputtering with Plasma Emission Intesity or Impedance Feedback systems, Best Poster Award(Silcver): 7th International Symposium on Tr (...)
Winner: Muto, S. Nakatomi, N. Oka, Y. Iwabuchi, H. Kotsubo, Y. Shigesato
Jun 2012
Electrochromic WO3 Films Deposited by Hollow Cathode Gas Flow Sputtering with Very High Deposition Rate, Poster Award 3rd Prize:9th International Conference on Coatings on Glass and Pla (...)
Winner: M. Watanabe, N. Oka, K. Sugie, Y. Iwabuchi, H. Kotsubo, Y. Shigesato
Sep 2013
In-free Transparent Conductive Films Deposited by Reactive Sputtering with a Sintered Metal Powder Target using Ne, Ar or Kr, Best Poster Award:2013-JSAP-MRS Joint Symposia, 2013.9.17-19, (...)
Winner: S. Yonekawa, S. Nakatomi, J. Jia, M. Imura, T. Kanai, Y. Shigesato
Sep 2013
The study on crystal growth of TiO2 films deposited by reactive sputtering, Best Poster Award:2013-JSAP-MRS Joint Symposia, 2013.9.17-19, Doshisha Uni (...)
Winner: H. Kotake, S. Nakatomi, J. Jia, S. Nakamura, T. Yagi, Y. Yamashita, N. Taketoshi, T. Baba, Y. Shigesato
Dec 2014
Temperature Dependence of Phonon or Free Electron Contributions on Thermal Conductivity of VO2 Thin Films across Metal-Insulator Transition, Award for Encouragement of Research in The 1st E-MRS/MRS-J Bilateral Symposia:The materials Resea (...)