| | YASUDA Masaaki Last updated: Nov 21, 2019 at 16:48 | Name | YASUDA Masaaki |
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Affiliation | Osaka Prefecture University |
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Section | Graduate School of Engineering, Division of Electronics, Mathematics and Physics |
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Job title | Associate Professor |
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Degree | Doctor(Engineering)(Osaka Prefecture University) |
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Education - 1994 Graduate School, Division of Engineering, Osaka Prefecture University - 1989 Faculty of Engineering, Osaka Prefecture University Published Papers Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography M. Yasuda, M. Koyama, K. Fukunari, M. Shirai, H. Kawata and Y. Hirai J. Photopolym. Sci. Technol. 32 339-343 2019 [Refereed] Fabrication of Self-Standing Polystyrene Thin Films with Fine Through Holes by Use of Water Soluble Resin Sacrificial Layer H. Kawata, K. Uchida, M. Yasuda, and Y. Hirai J. Photopolym. Sci. Technol. 32 137-141 2019 [Refereed] 90. Stochastic Simulation of Pattern Formation for Chemically Amplified Resist in Electron Beam Lithography YASUDA Masaaki Jpn. J. Appl. Phys. 58 SDDB01 2019 [Refereed] Stochastic simulation of pattern formation in electron beam lithography M. Yasuda, M. Koyama, M. Shirai, H. Kawata, and Y. Hirai J. Vac. Sci. Technol. B 36 06JA04 2018 [Refereed] Transfer Printing by Use of Delayed UV Cure Resin for Fabricating Multilayer Structures T. Yamamoto, M. Yasuda, Y. Hirai, and H. Kawata J. Photopolym. Sci. Technol. 31 657-662 2018 [Refereed] Books etc Computational Chemistry: Theories, Methods and Applications M. Yasuda and K. Tada (Part:Contributor, Chapter 4: Molecular Simulation of Electron Beam Nanofabrication) Nova Science Publishers 2014 |
Advances in Nanotechnology. Volume 11 M. Yasuda, K. Araki and Y. Hirai (Part:Contributor, Chapter 5: Molecular Flow during Polymer Filling Process in Nanoimprint Lithography) Nova Science Publishers 2014 |
Conference Activities & Talks Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography [Invited] M. Yasuda, M. Koyama, K. Fukunari, M. Shirai, H. Kawata and Y. Hirai 36th International Conference of Photopolymer Science and Technology Jun 2019 Computational Study of Pattern Formation in UV Nanoimprint Lithography [Invited] M. Yasuda, M. Koyama, R. Sakata, M. Shirai, H. Kawata and Y. Hirai 35th Int. Conf. of Photopolym. Sci. and Technol. Jun 2018 Computational Study of Temperature Distribution in Electron-Irradiated Graphene [Invited] Y. Ueno, H. Kawata, Y. Hirai and M. Yasuda 11th Int. Symp. on Atomic Level Characterizations for New Materials and Devices ’17 Dec 2017 Multiscale Simulation of Development Process in Electron Beam Lithography [Invited] M. Yasuda, S. Hitomi, H. Kawata and Y. Hirai 34th Int. Conf. of Photopolym. Sci. and Technol. Jun 2017 Multiphysics Simulation of Nanopatterning in Electron Beam Lithography [Invited] M. Yasuda, K. Tada and M. Kotera 33rd Int. Conf. of Photopolym. Sci. and Technol. Jun 2016 Research Grants & Projects Monte Carlo Simulation of Electron Scattering The Other Research Programs |
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