YASUDA Masaaki

J-GLOBAL         Last updated: Nov 21, 2019 at 16:48
 
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Name
YASUDA Masaaki
Affiliation
Osaka Prefecture University
Section
Graduate School of Engineering, Division of Electronics, Mathematics and Physics
Job title
Associate Professor
Degree
Doctor(Engineering)(Osaka Prefecture University)

Research Interests

 
 

Research Areas

 
 

Education

 
 
 - 
1994
Graduate School, Division of Engineering, Osaka Prefecture University
 
 
 - 
1989
Faculty of Engineering, Osaka Prefecture University
 

Published Papers

 
Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography
M. Yasuda, M. Koyama, K. Fukunari, M. Shirai, H. Kawata and Y. Hirai
J. Photopolym. Sci. Technol.   32 339-343   2019   [Refereed]
Fabrication of Self-Standing Polystyrene Thin Films with Fine Through Holes by Use of Water Soluble Resin Sacrificial Layer
H. Kawata, K. Uchida, M. Yasuda, and Y. Hirai
J. Photopolym. Sci. Technol.   32 137-141   2019   [Refereed]
90. Stochastic Simulation of Pattern Formation for Chemically Amplified Resist in Electron Beam Lithography
YASUDA Masaaki
Jpn. J. Appl. Phys.   58 SDDB01   2019   [Refereed]
Stochastic simulation of pattern formation in electron beam lithography
M. Yasuda, M. Koyama, M. Shirai, H. Kawata, and Y. Hirai
J. Vac. Sci. Technol. B   36 06JA04   2018   [Refereed]
Transfer Printing by Use of Delayed UV Cure Resin for Fabricating Multilayer Structures
T. Yamamoto, M. Yasuda, Y. Hirai, and H. Kawata
J. Photopolym. Sci. Technol.   31 657-662   2018   [Refereed]

Books etc

 
Computational Chemistry: Theories, Methods and Applications
M. Yasuda and K. Tada (Part:Contributor, Chapter 4: Molecular Simulation of Electron Beam Nanofabrication)
Nova Science Publishers   2014   
Advances in Nanotechnology. Volume 11
M. Yasuda, K. Araki and Y. Hirai (Part:Contributor, Chapter 5: Molecular Flow during Polymer Filling Process in Nanoimprint Lithography)
Nova Science Publishers   2014   

Conference Activities & Talks

 
Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography [Invited]
M. Yasuda, M. Koyama, K. Fukunari, M. Shirai, H. Kawata and Y. Hirai
36th International Conference of Photopolymer Science and Technology   Jun 2019   
Computational Study of Pattern Formation in UV Nanoimprint Lithography [Invited]
M. Yasuda, M. Koyama, R. Sakata, M. Shirai, H. Kawata and Y. Hirai
35th Int. Conf. of Photopolym. Sci. and Technol.   Jun 2018   
Computational Study of Temperature Distribution in Electron-Irradiated Graphene [Invited]
Y. Ueno, H. Kawata, Y. Hirai and M. Yasuda
11th Int. Symp. on Atomic Level Characterizations for New Materials and Devices ’17   Dec 2017   
Multiscale Simulation of Development Process in Electron Beam Lithography [Invited]
M. Yasuda, S. Hitomi, H. Kawata and Y. Hirai
34th Int. Conf. of Photopolym. Sci. and Technol.   Jun 2017   
Multiphysics Simulation of Nanopatterning in Electron Beam Lithography [Invited]
M. Yasuda, K. Tada and M. Kotera
33rd Int. Conf. of Photopolym. Sci. and Technol.   Jun 2016   

Research Grants & Projects

 
Monte Carlo Simulation of Electron Scattering
The Other Research Programs