2016年4月2日
Oxidation at Cs pre-adsorbed Si/6H-SiC(0001)-(3 × 3) reconstructed surfaces studied using metastable-induced electron spectroscopy
e-Journal of Surface Science and Nanotechnology
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- 巻
- 14
- 号
- 開始ページ
- 103
- 終了ページ
- 106
- 記述言語
- 英語
- 掲載種別
- DOI
- 10.1380/ejssnt.2016.103
- 出版者・発行元
- Surface Science Society of Japan
A Si-covered 6H-SiC(0001) surface was transformed from a Si-rich to C-rich one with increasing annealing temperature. An alkali metal is well known for promoting oxidation. We studied the oxidation to Cs pre-adsorption on a 6H-SiC(0001)-(3×3) reconstructed surface using metastable-induced electron spectroscopy (MIES), ultraviolet photoelectron spectroscopy (UPS), and low-energy electron diffraction (LEED). The (3×3) reconstructed surfaces was adsorbed Cs and exposed oxygen at room temperature. The MIES results show that the intensity of electron emission induced Cs6s increased with Cs evaporation. For the oxygen-exposed Cs/SiC surface, the emission intensity of the Cs6s-induced peak rapidly decreased and a dissociated adsorption oxygen-induced peak appeared. When the oxygen-adsorbed Cs/SiC(0001) surface was annealed until 800°C, Cs atoms were desorbed from the surface and O bonded with Si, forming SiO2.
- ID情報
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- DOI : 10.1380/ejssnt.2016.103
- ISSN : 1348-0391
- SCOPUS ID : 84975889825