MISC

2016年4月2日

Oxidation at Cs pre-adsorbed Si/6H-SiC(0001)-(3 × 3) reconstructed surfaces studied using metastable-induced electron spectroscopy

e-Journal of Surface Science and Nanotechnology
  • Tomonori Ikari
  • ,
  • Takuto Nakamura
  • ,
  • Kaede Hirayama
  • ,
  • Kousuke Muraoka
  • ,
  • Junko Ishii
  • ,
  • Masamichi Naitoh

14
開始ページ
103
終了ページ
106
記述言語
英語
掲載種別
DOI
10.1380/ejssnt.2016.103
出版者・発行元
Surface Science Society of Japan

A Si-covered 6H-SiC(0001) surface was transformed from a Si-rich to C-rich one with increasing annealing temperature. An alkali metal is well known for promoting oxidation. We studied the oxidation to Cs pre-adsorption on a 6H-SiC(0001)-(3×3) reconstructed surface using metastable-induced electron spectroscopy (MIES), ultraviolet photoelectron spectroscopy (UPS), and low-energy electron diffraction (LEED). The (3×3) reconstructed surfaces was adsorbed Cs and exposed oxygen at room temperature. The MIES results show that the intensity of electron emission induced Cs6s increased with Cs evaporation. For the oxygen-exposed Cs/SiC surface, the emission intensity of the Cs6s-induced peak rapidly decreased and a dissociated adsorption oxygen-induced peak appeared. When the oxygen-adsorbed Cs/SiC(0001) surface was annealed until 800°C, Cs atoms were desorbed from the surface and O bonded with Si, forming SiO2.

リンク情報
DOI
https://doi.org/10.1380/ejssnt.2016.103
ID情報
  • DOI : 10.1380/ejssnt.2016.103
  • ISSN : 1348-0391
  • SCOPUS ID : 84975889825

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