論文

2013年3月

Fabrication of 3-D PTFE microstructures utilising change of etching rate with respect to exposure time

MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS
  • Mitsuhiro Horade
  • ,
  • Susumu Sugiyama

19
3
開始ページ
351
終了ページ
356
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1007/s00542-012-1605-y
出版者・発行元
SPRINGER

In this study, we fabricated three-dimensional (3-D) polytetrafluoroethylene (PTFE) microstructures using the plane-pattern to cross-section transfer (PCT) method with synchrotron radiation (SR) ablation. We found that the etching rate increased with increasing SR exposure. This was attributed to the heating of the PTFE surface as evidenced by the emission of fluorocarbon gas from the surface. Using the PCT method, we successfully produced various 3-D PTFE microstructure shapes by varying the energy distribution of the SR exposure using multiple scanning speeds.

リンク情報
DOI
https://doi.org/10.1007/s00542-012-1605-y
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000315294000008&DestApp=WOS_CPL
ID情報
  • DOI : 10.1007/s00542-012-1605-y
  • ISSN : 0946-7076
  • Web of Science ID : WOS:000315294000008

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