2013年3月
Fabrication of 3-D PTFE microstructures utilising change of etching rate with respect to exposure time
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS
- ,
- 巻
- 19
- 号
- 3
- 開始ページ
- 351
- 終了ページ
- 356
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1007/s00542-012-1605-y
- 出版者・発行元
- SPRINGER
In this study, we fabricated three-dimensional (3-D) polytetrafluoroethylene (PTFE) microstructures using the plane-pattern to cross-section transfer (PCT) method with synchrotron radiation (SR) ablation. We found that the etching rate increased with increasing SR exposure. This was attributed to the heating of the PTFE surface as evidenced by the emission of fluorocarbon gas from the surface. Using the PCT method, we successfully produced various 3-D PTFE microstructure shapes by varying the energy distribution of the SR exposure using multiple scanning speeds.
- リンク情報
- ID情報
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- DOI : 10.1007/s00542-012-1605-y
- ISSN : 0946-7076
- Web of Science ID : WOS:000315294000008