宮下 文彬

Deposition of DLC : H films by C-sputtering assisted CH4-ArPE-CVD technique 

EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS 39(1) 17-21 2007年7月  

Preferential c-axis orientation and dielectric constants of thin BaTiO3 films deposited on Si wafers by a low energy ion beam assisted deposition technique 

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 257 468-471 2007年4月  

Neutralization and discharge of electron traps in hydrogenated diamond-like carbon films deposited on ground electrode by plasma-enhanced chemical vapor deposition 

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 46(4A) 1568-1570 2007年4月  

Nitrogen ion energy dependencies of dielectric constants and compositions of barium carbide-barium nitrate mixed films deposited on silicon wafers by an ion beam assisted deposition technique 

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 257 463-467 2007年4月  

Crystalline lattice phase-conversion on thin boron nitride films deposited on silicon wafers by an ion beam assisted deposition method 

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 257 459-462 2007年4月