中村 圭二

Direct Measurements of Sheath-Accelerated Secondary Electrons for Monitoring the in Cident Ion Flux in Plasma Immersion Ion Implantation 

Plasma Sources Science and Technology 11 2002年  

Direct Measurements of Sheath-Accelerated Secondary Electrons for Monitoring the in Cident Ion Flux in Plasma Immersion Ion Implantation 

Plasma Sources Science and Technology 11 2002年  

Alternating Bombardment Technique for Wall Surface Control in Depositive Plasma Processing(共著) 

Journal of Vacuum Science and Technology A 18(1) 137-142 2000年  

Plasma Absorption Probe for Measuring Electron Density in an Environment Soiled with Processing Plasma(共著) 

Japanese Journal of Applied Physics 38(9A) 5262-5266 1999年  

In-situ Monitoring of Incident Ion Flux Based on High-Energy Secondary Electron Measurements in Plasma Immersion Ion Implantation(共著) 

Abstract of 5th International Workshop on Plasma-Based Ion Implantation 1999年  

Diagnosis and Species Control of Pulse-Power-Modulated Etching Plasmas 

Abstract Book of First World Congress on Microwave Processing 117 1997年  

Energy Distribution and Etching Capability of Negative Ions in a Pulsed Inductively-Coupled Plasma in Chlorine 

Proceedings of the 3rd International Conference on Reactive Plasmas 439-440 1997年  

Direct Measurements of High-Energy Seordary Electrons During Plasma Immersion Ion Implantation 

Proceedings of the 3rd International Conference on Reactive Plasmas 307-308 1997年  

Large-Area Plasma Production Using an Internal Loop Antenna 

Proceedings of the 3rd International Conference on Reactive Plasmas 213-214 1997年  

Space-and Time-Resolved Measurements of Negative Ions in a Pulsed Inductively-Coupled Plasma in Chlorine 

Journal of Plasma and Fusion Research 73(1) 106-111 1997年  

Absolute Fluorine Atom Densities in Fluorocarbon High-Density Plasmas Measured by Appearance Mass Spectrometry 

Japanese Journal of Applied Physics 36(4A) L439-L442 1997年  

Diagnosis for advanced plasma control of materials processing 

Plasma Phys. Control. Fusion 39(5A) A445-A458 1997年  

Production of a large-diameter inductive plasma using an internal antenna 

Proceedings of the 1996 International Conference on Plasma Physics 1870-1873 1996年  

Negatlve Ions in a Pulsed-power inductively-coupled chlorine plasma for etching 

Proceedings of the 1996 International Conference on Plasma Physics 1882-1885 1996年