2011年6月
マイクロ波励起表面波プラズマ半導体処理装置の数値解析コードにおけるプラズマ電子密度分布の計算も含めた解析スキームの検討
日本学AEM会誌Vol.19,No.2 pp.348~353
- 巻
- 19
- 号
- 2
- 開始ページ
- 348
- 終了ページ
- 353
- 記述言語
- 日本語
- 掲載種別
- 出版者・発行元
- 日本AEM学会
The microwave excited surface wave plasma process enables us to do less damage processing by active neutral gaseous and wide area processing. On the other hand, the surface wave plasma is strong coupling phenomena of microwave and plasma, and detail understanding of the phenomena by any pure analytical methods is not easy. Authors have been working in development of numerical simulation tool for this equipment by using FDTD method. So far the FDTD method with appropriate plasma macro model which is partially based on experimental data of electron density was proposed and good agreements with experimental results was obtained. As the next stage of the development of the numerical code, this paper presents estimation of electron density distribution in simulation.
- リンク情報
-
- CiNii Articles
- http://ci.nii.ac.jp/naid/120004922114
- CiNii Books
- http://ci.nii.ac.jp/ncid/AN10457520
- URL
- http://hdl.handle.net/10258/1715
- ID情報
-
- ISSN : 0919-4452
- CiNii Articles ID : 120004922114
- CiNii Books ID : AN10457520