MISC

2009年5月

Metallic pattern fabrication in organic Mott insulating crystal by local X-ray irradiation

SOLID STATE COMMUNICATIONS
  • Naoki Yoneyama
  • ,
  • Takahiko Sasaki
  • ,
  • Norio Kobayashi
  • ,
  • Yuka Ikemoto
  • ,
  • Taro Moriwaki
  • ,
  • Hiroaki Kimura

149
19-20
開始ページ
775
終了ページ
777
記述言語
英語
掲載種別
DOI
10.1016/j.ssc.2009.02.034
出版者・発行元
PERGAMON-ELSEVIER SCIENCE LTD

We have fabricated a metallic structure in an organic Mott insulator kappa-(BEDT-TTF)(2)Cu[N(CN)(2)]Cl. The periodic metallic domains of approximately 90 x 90 mu m(2) obtained by X-ray irradiation through a molybdenum mesh mask are visualized by scanning microregion infrared reflectance spectroscopy technique. No deterioration by irradiation is found in a range of nanometer to micrometer scales. We demonstrate that the present processing method is applicable for the fabrication of molecular electronic devices. (C) 2009 Elsevier Ltd. All rights reserved.

リンク情報
DOI
https://doi.org/10.1016/j.ssc.2009.02.034
CiNii Articles
http://ci.nii.ac.jp/naid/80020292163
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000266149900010&DestApp=WOS_CPL
ID情報
  • DOI : 10.1016/j.ssc.2009.02.034
  • ISSN : 0038-1098
  • CiNii Articles ID : 80020292163
  • Web of Science ID : WOS:000266149900010

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