2009年5月
Metallic pattern fabrication in organic Mott insulating crystal by local X-ray irradiation
SOLID STATE COMMUNICATIONS
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- 巻
- 149
- 号
- 19-20
- 開始ページ
- 775
- 終了ページ
- 777
- 記述言語
- 英語
- 掲載種別
- DOI
- 10.1016/j.ssc.2009.02.034
- 出版者・発行元
- PERGAMON-ELSEVIER SCIENCE LTD
We have fabricated a metallic structure in an organic Mott insulator kappa-(BEDT-TTF)(2)Cu[N(CN)(2)]Cl. The periodic metallic domains of approximately 90 x 90 mu m(2) obtained by X-ray irradiation through a molybdenum mesh mask are visualized by scanning microregion infrared reflectance spectroscopy technique. No deterioration by irradiation is found in a range of nanometer to micrometer scales. We demonstrate that the present processing method is applicable for the fabrication of molecular electronic devices. (C) 2009 Elsevier Ltd. All rights reserved.
- リンク情報
- ID情報
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- DOI : 10.1016/j.ssc.2009.02.034
- ISSN : 0038-1098
- CiNii Articles ID : 80020292163
- Web of Science ID : WOS:000266149900010