論文

2022年1月1日

Functional nitrogen science based on plasma processing: quantum devices, photocatalysts and activation of plant defense and immune systems

Japanese Journal of Applied Physics
  • Toshiro Kaneko
  • Hiromitsu Kato
  • Hideaki Yamada
  • Muneaki Yamamoto
  • Tomoko Yoshida
  • Pankaj Attri
  • Kazunori Koga
  • Tomoyuki Murakami
  • Kazuyuki Kuchitsu
  • Sugihiro Ando
  • Yasuhiro Nishikawa
  • Kentaro Tomita
  • Ryo Ono
  • Tsuyohito Ito
  • Atsushi M. Ito
  • Koji Eriguchi
  • Tomohiro Nozaki
  • Takayoshi Tsutsumi
  • Kenji Ishikawa
  • 全て表示

61
SA
開始ページ
SA0805
終了ページ
SA0805
記述言語
掲載種別
研究論文(学術雑誌)
DOI
10.35848/1347-4065/ac25dc
出版者・発行元
IOP Publishing

<title>Abstract</title>
Nitrogen is a very common element, comprising approximately 78% of Earth’s atmosphere, and is an important component of various electronic devices while also being essential for life. However, it is challenging to directly utilize dinitrogen because of the highly stable triple bond in this molecule. The present review examines the use of non-equilibrium plasmas to generate controlled electron impacts as a means of generating reactive nitrogen species (RNS) with high internal energy values and extremely short lifetimes. These species include ground state nitrogen atoms, excited nitrogen atoms, etc. RNS can subsequently react with oxygen and/or hydrogen to generate new highly reactive compounds and can also be used to control various cell functions and create new functional materials. Herein, plasma-processing methods intended to provide RNS serving as short-lived precursors for a range of applications are examined in detail.

リンク情報
DOI
https://doi.org/10.35848/1347-4065/ac25dc
URL
https://iopscience.iop.org/article/10.35848/1347-4065/ac25dc
URL
https://iopscience.iop.org/article/10.35848/1347-4065/ac25dc/pdf
ID情報
  • DOI : 10.35848/1347-4065/ac25dc
  • ISSN : 0021-4922
  • eISSN : 1347-4065

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