論文

査読有り
2013年8月

Frustration of photoionization of Ar nanoplasma produced by extreme ultraviolet FEL pulses

JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS
  • H. Iwayama
  • K. Nagaya
  • M. Yao
  • H. Fukuzawa
  • X-J Liu
  • G. Pruemper
  • K. Motomura
  • K. Ueda
  • N. Saito
  • A. Rudenko
  • L. Foucar
  • M. Nagasono
  • A. Higashiya
  • M. Yabashi
  • T. Ishikawa
  • H. Ohashi
  • H. Kimura
  • 全て表示

46
16
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1088/0953-4075/46/16/164019
出版者・発行元
IOP PUBLISHING LTD

We report on the laser power dependence of photoabsorptions of Ar clusters irradiated by extreme ultraviolet-free electron laser (EUV-FEL) at the wavelength of 62 nm. We measured kinetic energy distributions of fragment ions with our ion momentum spectrometer. From the measured kinetic energy distributions, we estimated charge states of irradiated Ar clusters using the classical uniformly charged sphere model. Our results show that the EUV-FEL irradiation of Ar clusters results in the frustration of direct photoionization leading to nanoplasma formation and subsequent strong electron-ion charge recombination.

リンク情報
DOI
https://doi.org/10.1088/0953-4075/46/16/164019
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000323113100020&DestApp=WOS_CPL
ID情報
  • DOI : 10.1088/0953-4075/46/16/164019
  • ISSN : 0953-4075
  • Web of Science ID : WOS:000323113100020

エクスポート
BibTeX RIS