HABUKA Hitoshi

J-GLOBAL         Last updated: Mar 1, 2019 at 02:41
HABUKA Hitoshi
Yokohama National University
Faculty of Engineering Division of Materials Science and Chemical Engineering

Research Areas


Academic & Professional Experience

Apr 2002
Professor, Yokohama National University
Apr 2000
Mar 2002
Associate Professor, Yokohama National University
Apr 1986
Mar 2000
Shin-Etsu Chemical Co., Ltd. Isobe R&D Center


Department of chemical engineering, Graduate School, Division of Engineering, Hiroshima University
Department of chemistry, Graduate School, Division of Natural Science, Kyoto University
Department of chemistry, Faculty of Science, Niigata University

Published Papers

Hitoshi Habuka,Mitsuko Muroi,Miya Matsuo,Yuuki Ishida,Shiro Hara,Shin-Ichi Ikeda
Materials Science in Semiconductor Processing   88 192-197   Dec 2018   [Refereed]
Yuuki Ishida,Shin-Ichi Ikeda,Shiro Hara,Hitoshi Habuka,Kenta Irikura,Mitsuko Muroi,Ayami Yamada,Miya Matsuo
Materials Science in Semiconductor Processing   87 13-18   Nov 2018   [Refereed]
Ayami Yamada, Mitsuko Muroi, Toru Watanabe, Ayumi Saito, Ayumi Sakurai and Hitoshi Habuka
Semiconductor Science and Technology   33(9)    Jul 2018   [Refereed]
Miya Matsuo,Kento Miyazaki,Hitoshi Habuka,Akihiro Goto
ECS Journal of Solid State Science and Technology   7(9) N123-N127   2018   [Refereed]
Toru Watanabe, Ayami Yamada, Ayumi Saito, Ayumi Sakurai, Hitoshi Habuka
Materials Science in Semiconductor Processing   72 134-138   Dec 2017   [Refereed]



Books etc

Polycrystalline Films
Hitoshi Habuka (Part:Joint Work)
Nova Publisher   2017   ISBN:9781536108187
Silicon Epitaxial Reactor for Minimal Manufacturing
Hitoshi Habuka
"Epitaxy" Editor Miao Zhong   2017   ISBN:9789535152514
Advances in Medicine and Biology
Samar Soliman, Lavanya Elangovan, Yong Du, and Chandra Mohan, Parthasarathy Arumugam and Joon Myong Song, Xiu Liu and Yongzhen Gong, Ana Pilipović and MihaljPoša, Hitoshi Habuka, Spyridoula N. Papoutsi, Barbara Wolgamuth, Michelangelo Maestri, Enrica Bonanni, Nicholas-Tiberio Economou, Mélissa Simard, Isabelle Lorthois, Maxim Maheux, Bryan Roy, Louis-Charles Masson, Alexandre Morin, and Roxane Pouliot, Natavudh Townamchai and Somchai Eiam-Ong (Part:Joint Work, Chapter 5, "Organic Molecules Interaction Evaluated by In Situ Measurement and Rate Theory")
Nova Science Publishers   Sep 2016   ISBN:9781634855679
Hitoshi Habuka (Part:Joint Work, Chapter 4, "In Situ Observation of Chemical Vapour Deposition Using Langasite Crystal Microbalance")
InTech   Sep 2016   ISBN:9789535125730
Advances in Materials Science Research
Giuseppe Acciani, Hitoshi Habuka, Yuji Aoki, Masataka SugimotoYunxiang Tong, Yufeng Zheng, Li Li, Dmitry V. Gunderov, Min-Chie Chiu, Long-Jyi Yeh, Yao-Jen Lai, Mariyam Adnan, J. Jeyakodi Moses (Part:Joint Work, Chapter 2, "Chlorine Trifluoride Dry Etching for Silicon Carbide Material Production Process")
Nova Science Publishers   Aug 2016   ISBN:9781634831819

Conference Activities & Talks

Increase in Silicon Film Deposition Rate in a SiHCl3-SiHx-H2 System
A. Saito, A. Yamada, A. Sakurai and H. Habuka
18th International Conference on Crystal Growth and Epitaxy   Aug 2016   
Transport Phenomena in a Slim Vertical CVD Reactor for Minimal Manufacturing
A. Yamada, N. Li, M. Matsuo, H. Habuka, Y. Ishida, S. Ikeda and S. Hara
18th International Conference on Crystal Growth and Epitaxy   Aug 2016   
Etching rate behavior of 4H-silicon carbide epitaxial film using chlorine trifluoride gas
Asumi Hirooka, Hitoshi Habuka, Tomohisa Kato
International Conference on Silicon Carbide and Related Materials 2015   Oct 2015   
In Situ cleaning process of silicon carbide epitaxial reactor for removing film-type deposition formed on susceptor
Kosuke Mizuno, Hitoshi Habuka, Yuuki Ishida, Toshiyuki Ohno
International Conference on Silicon Carbide and Related Materials 2015   Oct 2015   
In-situ observation of chemical vapor deposition using SiHCl3 and BCl3 Gases
A. Saito, K. Miyazaki, M. Matsui and H. Habuka
EuroCVD20   Jul 2015   


Patent on measurement method for organic species concentration
The Others   2000
Patent surface cleaning Process of silicon
The Others   1999
Patent on Surface condition for crystal growth
The Others   1997
Patent on process for obtaining uniform thickness of crystal film
The Others   1996
Patent on producing light emitting cliodes
The Others   1989


Nov 2004
Etching technology for etching various materials
Apr 2004
Analysis of transport phenomena in a thin film formation reactor
Jul 2001
Semiconductor epitaxial growth reactor technology